SCHEMBL18804153

SCHEMBL18804153

CCC(COC)OCN1C(=O)N(COC(CC)COC)C2C1N(COC(CC)COC)C(=O)N2COC(CC)COC

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18804150 0.79 L3MBTL1 (0.33) L3MBTL1
SCHEMBL75394 0.72 L3MBTL1 (0.43) L3MBTL1
SCHEMBL196249 0.71 L3MBTL1 (0.39) L3MBTL1
SCHEMBL5691338 0.70
SCHEMBL14781344 0.70
SCHEMBL10056666 0.70 L3MBTL1 (0.57) L3MBTL1
SCHEMBL12748112 0.70 L3MBTL1 (0.57) L3MBTL1
SCHEMBL8402200 0.70 L3MBTL1 (0.57) L3MBTL1
SCHEMBL17813442 0.70 L3MBTL1 (0.57) L3MBTL1
SCHEMBL21029557 0.69 L3MBTL1 (0.35) L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed
US-20170123319-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-05-04 US disclosed