Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.32 |
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
| ▸ | BCHE | P06276 | 3/20 | 0.30 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | CYBB | P04839 | 1/20 | 0.30 |
| ▸ | APP | P05067 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | SNCA | P37840 | 1/20 | 0.30 |
| ▸ | NOX3 | Q9HBY0 | 1/20 | 0.30 |
| ▸ | NOX4 | Q9NPH5 | 1/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19771489 | 0.88 | ALDH1A1 (0.36) | ELANEMEN1MAPTKMT2AUSP2 | |
| SCHEMBL20306521 | 0.87 | MAPT (0.35) | ELANEMEN1MAPTKMT2AUSP2 | |
| SCHEMBL20306519 | 0.85 | ALDH1A1 (0.36) | ELANEMEN1MAPTKMT2AUSP2 | |
| SCHEMBL19335516 | 0.80 | DHFR (0.32) | MEN1MAPTKMT2AUSP2ALDH1A1 | |
| SCHEMBL9610564 | 0.80 | ELANE (0.32) | NOX1ELANE | |
| SCHEMBL9610548 | 0.78 | ELANE (0.39) | NOX1ELANEBCHEMEN1MAPT | |
| SCHEMBL9610589 | 0.77 | ALDH1A1 (0.35) | NOX1ELANEMEN1MAPTKMT2A | |
| SCHEMBL9610553 | 0.76 | ELANE (0.39) | NOX1ELANEBCHEMEN1MAPT | |
| SCHEMBL19771568 | 0.76 | — | — | |
| SCHEMBL9610569 | 0.74 | ELANE (0.33) | NOX1ELANEMAPTKMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9645498-B2 | Developer and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |