SCHEMBL18826529

SCHEMBL18826529

Nc1ccc(/N=N/c2ccc(Oc3ccc(NNc4ccc(N)cc4)cc3)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 7/20 0.54
▸ ALDH1A1 P00352 5/20 0.54
▸ RAB9A P51151 5/20 0.54
▸ MEN1 O00255 4/20 0.54
▸ KMT2A Q03164 4/20 0.54
▸ NPC1 O15118 4/20 0.54
▸ TDP1 Q9NUW8 3/20 0.54
▸ SMN1; SMN2 Q16637 3/20 0.54
▸ CYP3A4 P08684 1/20 0.54
▸ TSHR P16473 1/20 0.54
▸ L3MBTL1 Q9Y468 1/20 0.54
▸ MAOA P21397 2/20 0.47
▸ PKM P14618 1/20 0.47
▸ HTT P42858 1/20 0.47
▸ TEAD4 Q15561 1/20 0.45
▸ MAOB P27338 1/20 0.45
▸ POLB P06746 1/20 0.44
▸ MITF O75030 1/20 0.44
▸ GAA P10253 1/20 0.44
▸ GFER P55789 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11318103 0.88 MAPT (0.70) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18159944 0.88 MAPT (0.70) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18804043 0.88 MAPT (0.70) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18826526 0.88 ALDH1A1 (0.70) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18804042 0.88 MAPT (0.70) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18826486 0.87 MAPT (0.51) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18826525 0.85 MAPT (0.41) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18826528 0.77 ALDH1A1 (0.41) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18826531 0.77 MAPT (0.54) MAPTALDH1A1RAB9AMEN1KMT2A
SCHEMBL18804036 0.77 MAPT (0.54) MAPTALDH1A1RAB9AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9644071-B1 Bis(azobenzene) diamines and photomechanical polymers made therefrom THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2017-05-09 — — US disclosed
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