Propionic Acid

Propionic Acid

SCHEMBL1883017

CCC(=O)O.CCOCC.OCCO

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.56
ALDH1A1 P00352 8/20 0.46
SOAT1 P35610 1/20 0.38
TSHR P16473 2/20 0.37
HDAC3 O15379 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
TDP1 Q9NUW8 2/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CAMK2A Q9UQM7 1/20 0.33
CYP2D6 P10635 1/20 0.32
THRB P10828 1/20 0.32
EGLN1 Q9GZT9 1/20 0.32
PPARD Q03181 1/20 0.32
ALOX15 P16050 1/20 0.32
MGAM O43451 1/20 0.32
GAA P10253 1/20 0.32
SI P14410 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propionic Acid SCHEMBL906439 0.91 FFAR3 (0.67) FFAR3ALDH1A1SOAT1TSHRHDAC3
Propionic Acid SCHEMBL11213569 0.91 FFAR3 (0.67) FFAR3ALDH1A1SOAT1TSHRHDAC3
Ether SCHEMBL28429496 0.89 ALDH1A1 (0.46) FFAR3ALDH1A1SOAT1TSHRHDAC3
Propionic Acid SCHEMBL21247075 0.88 FFAR3 (0.62) FFAR3ALDH1A1SOAT1TSHRHDAC3
Ether SCHEMBL271068 0.86 ALDH1A1 (0.48) FFAR3ALDH1A1SOAT1TSHRTDP1
Ether SCHEMBL151167 0.86 ALDH1A1 (0.48) FFAR3ALDH1A1SOAT1TSHRTDP1
Triethylene Glycol SCHEMBL5411909 0.85 ALDH1A1 (0.56) FFAR3ALDH1A1SOAT1TSHRLMNA
Propionic Acid SCHEMBL50302 0.85 FFAR3 (0.77) FFAR3ALDH1A1TSHRHDAC3HDAC1
Propionic Acid SCHEMBL3700995 0.85
Propionic Acid SCHEMBL15476705 0.85 FFAR3 (0.77) FFAR3ALDH1A1TSHRHDAC3HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 157 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US claimed
US-20240118616-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2024-04-11 US claimed
CN-114409342-B Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-09-16 CN claimed
CN-114556216-A Positive photosensitive resin composition and display element using the same 株式会社东进世美肯 2022-05-27 CN claimed
CN-114409342-A Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-04-29 CN claimed
CN-108192488-B Solvent-based bi-component high-smoothness varnish composition, preparation method and application 广州立邦涂料有限公司 2021-03-02 CN claimed
CN-110627597-B Aviation color smoke agent and preparation method thereof 颜谷科技发展(天津)有限公司 2020-08-07 CN claimed
CN-106916503-B Single-component varnish composition, preparation method and application thereof 廊坊立邦涂料有限公司 2020-03-17 CN claimed
CN-106928410-B Organic silicon modified acrylic resin with high solid content and low viscosity, preparation method and application 立邦涂料(中国)有限公司 2020-02-07 CN claimed
CN-110627597-A Aviation color smoke agent and preparation method thereof 颜谷科技发展(天津)有限公司 2019-12-31 CN claimed
US-8492459-B2 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2013-07-23 US claimed
US-20090176936-A1 Ink composition and method of forming a pattern using the same LG DISPLAY CO., LTD. (KR) 2009-07-09 US claimed
US-12577401-B2 Curable resin composition, cured film formed therefrom, and electronic device having cured film SAMSUNG SDI CO., LTD. (KR) 2026-03-17 US disclosed
CN-114556216-B Positive photosensitive resin composition and display element using same 株式会社东进世美肯 2025-04-25 CN disclosed
US-12252587-B2 Curable resin composition, thin film, and color conversion panel and display device including thin film SAMSUNG SDI CO., LTD. (KR) 2025-03-18 US disclosed
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US disclosed
US-20050043422-A1 Process for producing synthetic resin foam DAIKIN INDUSTRIES, LTD. (JP) 2005-02-24 US disclosed
EP-1498439-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM, BLOWING AGENT, AND PREMIX Daikin Industries, Ltd. (JP) 2005-01-19 EP disclosed
EP-1457506-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM Daikin Industries, Ltd. (JP) 2004-09-15 EP disclosed
US-4022808-A ZINC-ALUMINUM-TITANIUM-TIN-IRON OR GROUP 5A AS CATALYSTS NIPPON SODA COMPANY LIMITED (JA) 1977-05-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12577401-B2 Curable resin composition, cured film formed therefrom, and electronic device having cured film SEM1, CARM1, CAD FFAR3 477/4885ALDH1A1 1948/4885SOAT1 1516/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.