SCHEMBL18840316

SCHEMBL18840316

CC1(C)OCC(C(F)(F)F)O1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL734849 0.78 CA2 (0.32) CA2
SCHEMBL2035953 0.76 CA2 (0.32) CA2
SCHEMBL1487014 0.74 CA2 (0.34) CA2
SCHEMBL5349777 0.74 CA2 (0.34) CA2
SCHEMBL1487031 0.74 CA2 (0.34) CA2
SCHEMBL19417878 0.74 MEN1 (0.36)
SCHEMBL18089136 0.74 MEN1 (0.36)
SCHEMBL18089126 0.74 MEN1 (0.36)
SCHEMBL9696039 0.72 HCRTR2 (0.33) CA2
SCHEMBL9696043 0.72 HCRTR2 (0.33) CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989849-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-06-05 US disclosed
US-20170131634-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed