SCHEMBL18840323

SCHEMBL18840323

CC1(C)OC2CCCC(C2)O1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18840311 0.88 MAPK1 (0.30) MAPK1NPSR1
SCHEMBL31741256 0.71 L3MBTL1 (0.35) MAPK1NPSR1
SCHEMBL14790100 0.71 L3MBTL1 (0.35) MAPK1NPSR1
SCHEMBL18840312 0.71 L3MBTL1 (0.35) MAPK1NPSR1
SCHEMBL15483027 0.71 L3MBTL1 (0.35) MAPK1NPSR1
SCHEMBL10689947 0.65 MAPK1 (0.39) MAPK1NPSR1
SCHEMBL8141964 0.65 MAPK1 (0.39) MAPK1NPSR1
SCHEMBL12633006 0.65 MAPK1 (0.39) MAPK1NPSR1
SCHEMBL6466868 0.65 MAPK1 (0.39) MAPK1NPSR1
SCHEMBL18840314 0.63 MAPK1 (0.34) MAPK1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989849-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-06-05 US disclosed
US-20170131634-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed