SCHEMBL18844155

SCHEMBL18844155

C=C(C)c1cccc(CC(=O)O)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 1/20 0.50
CYP1A2 P05177 1/20 0.47
CYP2C19 P33261 1/20 0.47
FOLH1 Q04609 1/20 0.44
NR1H4 Q96RI1 1/20 0.44
AGBL2 Q5U5Z8 1/20 0.44
MEN1 O00255 1/20 0.43
FFAR1 O14842 1/20 0.43
TP53 P04637 1/20 0.43
GLA P06280 1/20 0.43
KMT2A Q03164 1/20 0.43
HPSE Q9Y251 1/20 0.43
KDM4E B2RXH2 2/20 0.43
MAPT P10636 2/20 0.43
HPGD P15428 2/20 0.43
HSD17B10 Q99714 2/20 0.43
RGS12 O14924 1/20 0.43
LMNA P02545 1/20 0.43
POLB P06746 1/20 0.43
GAA P10253 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1706376 0.85 MAOB (0.54) AKR1B1CYP1A2CYP2C19FOLH1NR1H4
SCHEMBL15317622 0.83 KEAP1 (0.53) FFAR1ALDH1A1
SCHEMBL29382329 0.81 FOLH1 (0.66) AKR1B1FOLH1HIF1A
SCHEMBL19202273 0.81 AKR1B1 (0.58) AKR1B1CYP1A2CYP2C19FOLH1AGBL2
SCHEMBL2707508 0.81 FOLH1 (0.66) AKR1B1FOLH1HIF1A
SCHEMBL18095084 0.79 FOLH1 (0.63) AKR1B1FOLH1KMT2AHIF1A
SCHEMBL12976383 0.79 MAPT (0.56) CYP1A2MAPTHSD17B10
SCHEMBL70565 0.78 AKR1B1 (0.71) AKR1B1CYP1A2CYP2C19MEN1KMT2A
SCHEMBL2426602 0.78 AKR1B1 (0.54) AKR1B1CYP1A2CYP2C19FOLH1MAPT
SCHEMBL512838 0.78 ATM (0.63) AKR1B1FOLH1TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-30 US disclosed
US-9958776-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-01 US disclosed
US-9897914-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-20 US disclosed
US-20170184964-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170174922-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-22 US disclosed
US-20170130071-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200241414-A1 RESIST COMPOSITION AND PATTERNING PROCESS INSR, HNRNPU, HNRNPR AKR1B1 3173/4885CYP1A2 4803/4885CYP2C19 4314/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.