SCHEMBL18845155

SCHEMBL18845155

C[C@@H]1C2C[C@@]3(CC4C5C[C@]6(C)CC4C[C@@](C)(C5)C6)C(=O)OC1C3O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15147160 0.69 UBE2D3 (0.31) —
SCHEMBL17853715 0.69 UBE2D3 (0.31) —
SCHEMBL22201021 0.61 — —
SCHEMBL2549983 0.55 GRIN1 (0.35) —
SCHEMBL11699962 0.54 GRIN1 (0.34) —
SCHEMBL11989123 0.53 MGAM (0.31) —
SCHEMBL13416098 0.52 GRIN1 (0.34) —
SCHEMBL13057396 0.51 MAPT (0.31) —
SCHEMBL18872442 0.51 MAPT (0.31) —
SCHEMBL21963416 0.51 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170131635-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 — — US disclosed
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