Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 18/20 | 0.42 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5521859 | 0.86 | HSD11B1 (0.44) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL19261037 | 0.84 | HSD11B1 (0.46) | HSD11B1HSD11B2 | |
| SCHEMBL19976016 | 0.82 | HSD11B1 (0.39) | HSD11B1EPHX2 | |
| SCHEMBL13430021 | 0.81 | HSD11B1 (0.43) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL12824509 | 0.80 | HSD11B1 (0.43) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL12128673 | 0.80 | HSD11B1 (0.46) | HSD11B1HSD11B2 | |
| SCHEMBL14527522 | 0.79 | HSD11B1 (0.42) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL13553287 | 0.78 | HSD11B1 (0.39) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL13081509 | 0.76 | HSD11B1 (0.44) | HSD11B1HSD11B2EPHX2 | |
| SCHEMBL14732672 | 0.74 | HSD11B1 (0.39) | HSD11B1HSD11B2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904172-B2 | Shrink material and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9790166-B2 | Polymer, monomer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-17 | — | — | US | disclosed |
| US-9758609-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | H1-2, H1-0, H1-4 | HSD11B1 2220/4885HSD11B2 3156/4885EPHX2 647/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.