⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18845364 | 0.91 | — | — | |
| SCHEMBL18845039 | 0.88 | CYP17A1 (0.30) | — | |
| SCHEMBL19335848 | 0.88 | — | — | |
| SCHEMBL9924489 | 0.88 | — | — | |
| SCHEMBL19261138 | 0.84 | GAA (0.33) | — | |
| SCHEMBL18845370 | 0.83 | ALDH1A1 (0.32) | — | |
| SCHEMBL18400995 | 0.81 | HSD11B1 (0.36) | — | |
| SCHEMBL19261224 | 0.81 | HSD11B1 (0.36) | — | |
| SCHEMBL18845362 | 0.78 | — | — | |
| SCHEMBL2754862 | 0.78 | GAA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9758609-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |