SCHEMBL18857053

SCHEMBL18857053

CCCOCCOCCCCc1ccc(CC)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
LMNA P02545 2/20 0.47
CYP3A4 P08684 2/20 0.47
MEN1 O00255 1/20 0.47
USP2 O75604 1/20 0.47
MAPK1 P28482 1/20 0.47
CASP1 P29466 1/20 0.47
KMT2A Q03164 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
SLCO1B3 Q9NPD5 1/20 0.47
SLCO1B1 Q9Y6L6 1/20 0.47
TAAR1 Q96RJ0 1/20 0.42
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ESR1 P03372 2/20 0.41
ADRA2A P08913 2/20 0.41
ADORA3 P0DMS8 2/20 0.41
TACR2 P21452 2/20 0.41
SLC6A2 P23975 2/20 0.41
SLC6A4 P31645 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18531554 0.92 ALDH1A1 (0.50) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL21175586 0.92 TAAR1 (0.48) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL8750433 0.90 TDP1 (0.49) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL18857101 0.86 TAAR1 (0.46) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL21175577 0.84 ALDH1A1 (0.53) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL28656684 0.83 ESR1 (0.63) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL25560834 0.83 ALDH1A1 (0.43) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL12558942 0.83 MAOB (0.52) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL26857605 0.82 L3MBTL1 (0.54) MEN1KMT2ATDP1L3MBTL1KCNH2
SCHEMBL9357895 0.82 ALDH1A1 (0.61) ALDH1A1LMNACYP3A4MEN1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170351178-A1 COMPOSITION FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER SUITABLE FOR NEGATIVE TONE DEVELOPMENT DONGJIN SEMICHEM CO., LTD. (KR) 2017-12-07 US disclosed
US-9651867-B2 Compound and composition for forming lower film of resist pattern, and method for forming lower film using same DONGJIN SEMICHEM CO., LTD. (KR) 2017-05-16 US disclosed