SCHEMBL18872221

SCHEMBL18872221

CCCOCCSc1ccc(OCCOC)c2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 4/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ PTGS2 P35354 1/20 0.39
▸ MEN1 O00255 8/20 0.39
▸ KMT2A Q03164 8/20 0.39
▸ ALDH1A1 P00352 5/20 0.39
▸ HTT P42858 3/20 0.39
▸ TDP1 Q9NUW8 3/20 0.39
▸ LMNA P02545 2/20 0.39
▸ MAPT P10636 2/20 0.39
▸ HPGD P15428 2/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ CNR1 P21554 4/20 0.37
▸ CNR2 P34972 4/20 0.37
▸ NPSR1 Q6W5P4 2/20 0.36
▸ NPC1 O15118 1/20 0.35
▸ POLB P06746 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ IDO1 P14902 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15521566 0.91 KMT2A (0.39) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL19245461 0.89 PTGS2 (0.49) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL18256394 0.86 PTGS2 (0.43) PTGS2MEN1KMT2AALDH1A1HTT
SCHEMBL25738349 0.86 MEN1 (0.43) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL25738395 0.85 MEN1 (0.36) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL17285481 0.85 MEN1 (0.43) PTGS2MEN1KMT2AALDH1A1HTT
SCHEMBL18872216 0.84 MEN1 (0.45) PTGS2MEN1KMT2AALDH1A1HTT
SCHEMBL19245686 0.82 SLC2A1 (0.39) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL15521596 0.81 PTGS2 (0.46) KDM4ESMN1; SMN2PTGS2MEN1KMT2A
SCHEMBL19043851 0.81 PTGS2 (0.41) KDM4ESMN1; SMN2PTGS2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
EP-3081988-B1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-08-16 — — EP disclosed
EP-3205640-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-08-16 — — EP disclosed
EP-3168207-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-05-17 — — EP disclosed
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