SCHEMBL19245686

SCHEMBL19245686

CCCOCCSc1ccc(OCC(F)(F)F)c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC2A1 P11166 2/20 0.39
▸ PTGS2 P35354 1/20 0.38
▸ MEN1 O00255 5/20 0.34
▸ KMT2A Q03164 5/20 0.34
▸ HTT P42858 3/20 0.34
▸ TDP1 Q9NUW8 3/20 0.34
▸ MAPT P10636 3/20 0.34
▸ HPGD P15428 3/20 0.34
▸ LMNA P02545 2/20 0.34
▸ ALDH1A1 P00352 2/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ CNR1 P21554 3/20 0.33
▸ CNR2 P34972 3/20 0.33
▸ SMN1; SMN2 Q16637 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ EGFR P00533 1/20 0.31
▸ TUBB4A P04350 1/20 0.31
▸ TUBB P07437 1/20 0.31
▸ TUBA3C P0DPH7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18872214 0.85 SLC2A1 (0.43) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL19245461 0.84 PTGS2 (0.49) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL19245474 0.84 SLC2A1 (0.45) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL18872221 0.82 KDM4E (0.40) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL15521596 0.76 PTGS2 (0.46) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL19043707 0.76 PTGS2 (0.42) SLC2A1PTGS2MEN1KMT2AHTT
SCHEMBL25738393 0.75 LMNA (0.41) PTGS2HTTTDP1MAPTHPGD
SCHEMBL19245462 0.74 PTGS2 (0.43) PTGS2KMT2AMAPTL3MBTL1KDM4E
SCHEMBL15521566 0.73 KMT2A (0.39) PTGS2MEN1KMT2AHTTTDP1
SCHEMBL14407862 0.73 CNR1 (0.47) SLC2A1PTGS2MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
EP-3205640-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-08-16 — — EP disclosed
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