⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methoxymethane SCHEMBL10420459 | 0.93 | CYP2C19 (0.56) | — | |
| Ethylene Glycol SCHEMBL11213499 | 0.89 | CYP2C19 (0.56) | — | |
| SCHEMBL11528463 | 0.85 | MEN1 (0.50) | — | |
| SCHEMBL1434603 | 0.85 | CYP2C19 (0.64) | — | |
| SCHEMBL11804455 | 0.84 | — | — | |
| SCHEMBL28704524 | 0.82 | CYP2C19 (0.50) | — | |
| SCHEMBL27921447 | 0.81 | — | — | |
| SCHEMBL28686531 | 0.80 | FAAH (0.48) | — | |
| SCHEMBL21069032 | 0.80 | FAAH (0.48) | — | |
| SCHEMBL20511453 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110283320-B | Synthesis method of antibacterial hydrogel capable of being hydrolyzed under weak alkaline | 浙江工业大学 | 2021-08-24 | — | — | CN | claimed |
| US-11958802-B2 | Migration-resistant photopolymerization sensitizer | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2024-04-16 | — | — | US | disclosed |
| CN-113166036-B | Photopolymerizing sensitizers with migration resistance | 川崎化成工业株式会社 | 2023-10-10 | — | — | CN | disclosed |
| US-20220106254-A1 | MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| CN-110283320-B | Synthesis method of antibacterial hydrogel capable of being hydrolyzed under weak alkaline | 浙江工业大学 | 2021-08-24 | — | — | CN | disclosed |
| CN-113166036-A | Photopolymerisable sensitizers having migration resistance | 川崎化成工业株式会社 | 2021-07-23 | — | — | CN | disclosed |
| WO-2020121544-A1 | MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-06-18 | — | — | WO | disclosed |
| WO-2020054874-A1 | PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| WO-2020054116-A1 | PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| US-9012363-B2 | Granular controlled release agrochemical compositions and process for the preparation thereof | EVERRIS INTERNATIONAL B.V. (NL) | 2015-04-21 | — | — | US | disclosed |
| US-4238551-A | RHODIUM COATING, ACID RESISTANCE | HALCON RESEARCH & DEVELOPMENT CORPORATION (US) | 1980-12-09 | — | — | US | disclosed |
| US-4185147-A | Production of amino-silicate compounds, condensation resinous products and foam | BLOUNT DAVID H | 1980-01-22 | — | — | US | disclosed |
| US-4160833-A | ANIMAL FEED ADDITIVE AND MICROBIOCIDE | CIBA-GEIGY CORPORATION (US) | 1979-07-10 | — | — | US | disclosed |
| US-4153806-A | Recovery of vicinal glycol esters by plural stage distillation | HALCON RESEARCH AND DEVELOPMENT CORP. (US) | 1979-05-08 | — | — | US | disclosed |
| US-4146509-A | ORGANIC AMMONIUM COMPOUNDS USED AS POLYMERIZATION CATALYSTS | BAYER AKTIENGESELLSCHAFT (DE) | 1979-03-27 | — | — | US | disclosed |
| US-4142030-A | POLYURETHANE-SILICATE | BAYER AKTIENGESELLSCHAFT (DE) | 1979-02-27 | — | — | US | disclosed |
| US-4139560-A | Nonylamines | CIBA GEIGY CORPORATION (US) | 1979-02-13 | — | — | US | disclosed |
| US-4042536-A | POLYISOCYANATE, SILICIC ACID, XEROGEL | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-16 | — | — | US | disclosed |
| US-3991124-A | FOR CONTROLLING MICROORGANISMS AND HELMINTHS | CIBA-GEIGY CORPORATION (US) | 1976-11-09 | — | — | US | disclosed |
| US-3956402-A | MICROBIOCIDES | CIBA-GEIGY CORPORATION (US) | 1976-05-11 | — | — | US | disclosed |