SCHEMBL18897972

SCHEMBL18897972

CCC(C)(I)C(=O)OCCOc1cccc2c(O)cccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 1/20 0.40
▸ ESR1 P03372 12/20 0.39
▸ ESR2 Q92731 12/20 0.39
▸ MEN1 O00255 5/20 0.38
▸ KMT2A Q03164 5/20 0.38
▸ GAA P10253 4/20 0.38
▸ JAK2 O60674 2/20 0.38
▸ MAPT P10636 2/20 0.38
▸ USP2 O75604 1/20 0.38
▸ ALOX15 P16050 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ POLB P06746 1/20 0.37
▸ LMNA P02545 1/20 0.36
▸ CNR1 P21554 2/20 0.36
▸ CNR2 P34972 2/20 0.36
▸ KDM4E B2RXH2 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ HPGD P15428 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15113874 0.87 IDO1 (0.42) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL18671983 0.85 ESR1 (0.49) ESR1ESR2MEN1KMT2AGAA
SCHEMBL20215425 0.84 TYR (0.36) KDM4ECDC25B
SCHEMBL12128715 0.83 ESR1 (0.44) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL20215428 0.82 CDC25B (0.45) ESR1ESR2MEN1KMT2AGAA
SCHEMBL18671832 0.78 CDC25B (0.37) ESR1ESR2MEN1KMT2AGAA
SCHEMBL18671905 0.78 ESR1 (0.42) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL18898038 0.78 KDM4E (0.42) HSD17B10LMNAKDM4EALDH1A1CDC25B
SCHEMBL20691725 0.77 IDO1 (0.42) IDO1ESR1ESR2MEN1KMT2A
SCHEMBL12128599 0.76 ESR1 (0.40) IDO1ESR1ESR2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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