SCHEMBL20215425

SCHEMBL20215425

CCC(C)(I)C(=O)OCCc1cccc2c(O)cccc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYR P14679 1/20 0.36
▸ IAPP P10997 4/20 0.36
▸ CDC25B P30305 2/20 0.36
▸ CA12 O43570 1/20 0.35
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ CA7 P43166 1/20 0.35
▸ CA9 Q16790 1/20 0.35
▸ CA14 Q9ULX7 1/20 0.35
▸ CDYL Q9Y232 1/20 0.34
▸ GABRA1 P14867 1/20 0.33
▸ GABRB2 P47870 1/20 0.33
▸ S1PR1 P21453 1/20 0.33
▸ S1PR3 Q99500 1/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ BID P55957 3/20 0.32
▸ MCL1 Q07820 3/20 0.32
▸ BCL2L1 Q07817 2/20 0.32
▸ BAK1 Q16611 2/20 0.32
▸ KAT8 Q9H7Z6 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18671832 0.87 CDC25B (0.37) IAPPCDC25BCA12CA1CA2
SCHEMBL14461688 0.87 TYR (0.38) TYRIAPPCDC25BCA12CA1
SCHEMBL18400983 0.85 TYR (0.40) TYRIAPPCDC25BCA12CA1
SCHEMBL18898014 0.84 S1PR1 (0.30) S1PR1S1PR3
SCHEMBL20215428 0.84 CDC25B (0.45) CDC25BCA12CA1CA2CA7
SCHEMBL18897972 0.84 IDO1 (0.40) CDC25BKDM4E
SCHEMBL18671830 0.79 IDO1 (0.35) CDC25BKDM4EEP300
SCHEMBL18671983 0.79 ESR1 (0.49) CDC25BCA12CA1CA2CA7
SCHEMBL18898038 0.79 KDM4E (0.42) CDC25BKDM4E
SCHEMBL20691726 0.76 TYR (0.41) TYRIAPPCDC25BCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
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