⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19261112 | 0.94 | — | — | |
| SCHEMBL6368482 | 0.83 | HMGCR (0.35) | — | |
| SCHEMBL18898007 | 0.82 | CYP3A4 (0.41) | — | |
| SCHEMBL6367326 | 0.77 | HMGCR (0.36) | — | |
| SCHEMBL18898078 | 0.76 | EPHX1 (0.36) | — | |
| SCHEMBL18898001 | 0.75 | HSD11B1 (0.32) | — | |
| SCHEMBL18897999 | 0.73 | — | — | |
| SCHEMBL21208268 | 0.72 | — | — | |
| SCHEMBL18898003 | 0.72 | ALDH1A1 (0.44) | — | |
| SCHEMBL5613181 | 0.70 | CYP4F2 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9665002-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-30 | — | — | US | disclosed |