SCHEMBL18905253

SCHEMBL18905253

OC1(c2cccc([SiH3])c2)C2CC3CC(C2)CC1C3

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 8/20 0.38
ALOX5AP P20292 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18905327 0.80 HSD11B1 (0.33) HSD11B1
SCHEMBL23620372 0.79 HSD11B1 (0.58) HSD11B1
SCHEMBL6898977 0.79 CHRNA1 (0.43) HSD11B1
SCHEMBL18905254 0.78 HSD11B1 (0.39) HSD11B1
SCHEMBL6896759 0.77 HSD11B1 (0.53) HSD11B1ALOX5AP
SCHEMBL21002189 0.76 KDM1A (0.49) HSD11B1
SCHEMBL6899454 0.76 HSD11B1 (0.39) HSD11B1
SCHEMBL30791157 0.76 KDM1A (0.49) HSD11B1
SCHEMBL7079057 0.76 KDM1A (0.50)
SCHEMBL18905267 0.74 ALOX5AP (0.42) HSD11B1ALOX5AP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed