SCHEMBL18905397

SCHEMBL18905397

[SiH3]CCc1ccc(C2=CC3CCC2C3)cc1

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.31
PDE3B Q13370 1/20 0.31
PDE3A Q14432 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18905537 0.91 SPHK1 (0.31)
SCHEMBL9101137 0.82 PDE3B (0.36) CYP19A1PDE3BPDE3A
SCHEMBL18905440 0.80 CYP19A1 (0.32) CYP19A1
SCHEMBL6257347 0.80 CHRM2 (0.36) CYP19A1PDE3BPDE3A
SCHEMBL18905436 0.78 PDE3B (0.33) CYP19A1PDE3BPDE3A
SCHEMBL18905384 0.77 FDFT1 (0.32)
SCHEMBL151868 0.74 NPC1 (0.35) PDE3BPDE3A
SCHEMBL18911211 0.74 CYP19A1 (0.32) CYP19A1
SCHEMBL4507498 0.73 NPC1 (0.34) PDE3BPDE3A
SCHEMBL87884 0.73 NPC1 (0.34) PDE3BPDE3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed