SCHEMBL18905460

SCHEMBL18905460

C/C=C/c1ccc(OCCC[SiH3])cc1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.52
▸ LMNA P02545 2/20 0.52
▸ TP53 P04637 1/20 0.52
▸ CYP3A4 P08684 1/20 0.52
▸ TSHR P16473 1/20 0.52
▸ KDM4E B2RXH2 1/20 0.52
▸ MAPT P10636 2/20 0.51
▸ HPGD P15428 2/20 0.51
▸ HTT P42858 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.51
▸ APP P05067 10/20 0.47
▸ AHR P35869 1/20 0.46
▸ PTPN1 P18031 1/20 0.44
▸ CHRNB4 P30926 1/20 0.44
▸ CHRNA3 P32297 1/20 0.44
▸ CHRNA7 P36544 1/20 0.44
▸ CHRNA10 Q9GZZ6 1/20 0.44
▸ CHRNA9 Q9UGM1 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30801509 0.85 AHR (0.62) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL13757288 0.85 AHR (0.62) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL18905392 0.82 ALDH1A1 (0.57) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL18905559 0.82 AHR (0.47) ALDH1A1TP53KDM4EMAPTHPGD
SCHEMBL18354321 0.81 PTGS1 (0.58) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL18905560 0.81 AHR (0.46) APPAHRPTPN1CHRNB4CHRNA3
SCHEMBL10000751 0.80 NR5A1 (0.58) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL12112414 0.80 NR5A1 (0.58) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL13018361 0.80 NR5A1 (0.58) ALDH1A1LMNATP53CYP3A4TSHR
SCHEMBL11756105 0.79 ALDH1A1 (0.53) ALDH1A1LMNATP53CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 — — US disclosed
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