SCHEMBL18910992

SCHEMBL18910992

CCCc1ccc(C(C)OC)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACACB O00763 2/20 0.41
ACACA Q13085 1/20 0.41
LPL P06858 1/20 0.41
LIPG Q9Y5X9 1/20 0.41
TAS1R3 Q7RTX0 1/20 0.39
TAS1R1 Q7RTX1 1/20 0.39
CA2 P00918 1/20 0.38
KMT2A Q03164 1/20 0.38
THRB P10828 1/20 0.37
SIGMAR1 Q99720 1/20 0.37
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
GAA P10253 1/20 0.36
HPGD P15428 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MGLL Q99685 1/20 0.36
PLK1 P53350 1/20 0.36
FFAR1 O14842 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15115428 1.00 ACACB (0.41) ACACBACACALPLLIPGTAS1R3
SCHEMBL8750369 0.85 HTR2A (0.53) LPLLIPGKDM4EALDH1A1MGLL
SCHEMBL8750498 0.85 HTR2A (0.53) LPLLIPGKDM4EALDH1A1MGLL
SCHEMBL9069719 0.83 TDP1 (0.48) LPLLIPGALDH1A1HPGDL3MBTL1
SCHEMBL18910939 0.82 AKR1C3 (0.43) ACACBACACASIGMAR1KDM4ESMN1; SMN2
SCHEMBL1050122 0.82 TAAR1 (0.53) KMT2AKDM4EALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL12090708 0.82 LPL (0.44) ACACBACACALPLLIPGTAS1R3
SCHEMBL18905463 0.82 FFAR1 (0.35) L3MBTL1HTTSMN1; SMN2FFAR1
SCHEMBL1781027 0.81 LPL (0.42) ACACBACACALPLLIPGTAS1R3
SCHEMBL9762170 0.81 MAPT (0.49) ACACBACACATAS1R3TAS1R1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170154766-A1 SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-01 US disclosed