SCHEMBL18913699

SCHEMBL18913699

CC(C)(C)C1(C)c2ccccc2-c2ccccc21

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 11/20 0.43
THRB P10828 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
S100A4 P26447 1/20 0.35
KDM4E B2RXH2 1/20 0.35
MEN1 O00255 1/20 0.35
LMNA P02545 1/20 0.35
MAPT P10636 1/20 0.35
OPRK1 P41145 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ALDH1A1 P00352 1/20 0.33
HBB P68871 1/20 0.33
HSD17B10 Q99714 1/20 0.33
ITGA4 P13612 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21120648 0.81 PDK2 (0.40) PDK2THRBTDP1S100A4KDM4E
SCHEMBL13103932 0.78 PDK2 (0.58) PDK2
SCHEMBL21880268 0.78 PDK2 (0.38) PDK2THRBTDP1LMNAKMT2A
SCHEMBL15497968 0.76 PDK2 (0.47) PDK2TDP1MEN1LMNAMAPT
SCHEMBL24973268 0.73 PDK2 (0.41) PDK2THRBTDP1S100A4KDM4E
SCHEMBL7312926 0.73 PDK2 (0.64) PDK2
SCHEMBL283246 0.73 HTR2A (0.48) PDK2THRBTDP1S100A4KDM4E
SCHEMBL18383337 0.73 PDK2 (0.44) PDK2THRBTDP1S100A4KDM4E
SCHEMBL29363404 0.73 HTR2A (0.48) PDK2THRBTDP1S100A4KDM4E
SCHEMBL29386757 0.73 PDK2 (0.44) PDK2THRBTDP1S100A4KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359123-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-11-09 US disclosed
US-11767398-B2 Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life MERCK PATENT GMBH (DE) 2023-09-26 US disclosed
US-20230161246-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-25 US disclosed
US-20220025109-A1 SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN ALKYNYLOXY SUBSTITUTED SPIN-ON CARBON COMPONENT USEFUL AS HARD MASKS AND FILLING MATERIALS WITH IMPROVED SHELF LIFE MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) 2022-01-27 US disclosed
US-20170153548-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 US disclosed