SCHEMBL18940535

SCHEMBL18940535

CCO[Si](CCCS(C)(=O)=O)(OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1097437 0.84
SCHEMBL7114758 0.84 CA2 (0.30) CA2
SCHEMBL1095388 0.81
SCHEMBL991537 0.81 APP (0.38) LMNA
SCHEMBL28429657 0.81
SCHEMBL5586705 0.81
Hydrochloric Acid SCHEMBL27622106 0.79 APP (0.37) LMNA
SCHEMBL18940694 0.76
SCHEMBL315210 0.75
SCHEMBL329186 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106662820-B Composition for forming silicon-containing resist underlayer film having halosulfonylalkyl group 日产化学工业株式会社 2021-06-22 CN disclosed
US-11022884-B2 Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-06-01 US disclosed
US-20170168397-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING HALOGENATED SULFONYLALKYL GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-15 US disclosed