SCHEMBL1894783

SCHEMBL1894783

O=S(=O)(O)c1cccc(C(F)(F)F)c1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.66
CA2 P00918 2/20 0.66
MMP1 P03956 1/20 0.66
MMP2 P08253 1/20 0.66
MMP9 P14780 1/20 0.66
MMP8 P22894 1/20 0.66
MMP13 P45452 1/20 0.66
CES2 O00748 1/20 0.55
AKR1B1 P15121 1/20 0.53
MRGPRX4 Q96LA9 1/20 0.52
TSHR P16473 2/20 0.52
ALDH1A1 P00352 1/20 0.52
HSD17B10 Q99714 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
HTT P42858 1/20 0.51
LMNA P02545 1/20 0.51
MEN1 O00255 1/20 0.50
GAA P10253 1/20 0.50
KMT2A Q03164 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30035768 1.00 CA1 (0.66) CA1CA2MMP1MMP2MMP9
Hydrochloric Acid SCHEMBL640353 0.98 CA1 (0.64) CA1CA2MMP1MMP2MMP9
SCHEMBL5082296 0.98 CA1 (0.64) CA1CA2MMP1MMP2MMP9
SCHEMBL6114473 0.98 CA1 (0.64) CA1CA2MMP1MMP2MMP9
Ethylene SCHEMBL28426709 0.96 CA1 (0.62) CA1CA2MMP1MMP2MMP9
SCHEMBL30957969 0.86 TSHR (0.50) CA1CA2MMP1MMP2MMP9
SCHEMBL1054334 0.86 TSHR (0.50) CA1CA2MMP1MMP2MMP9
SCHEMBL29915956 0.85 CA1 (0.50) CA1CA2MMP1MMP2MMP9
SCHEMBL30859041 0.83 CA1 (0.65) CA1CA2MMP1MMP2MMP9
SCHEMBL8863056 0.83 CA1 (0.65) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117843682-A Phosphonium salt photoacid generator, preparation method and application thereof 万华化学集团股份有限公司 2024-04-09 CN claimed
EP-3365168-B1 LIGHTWEIGHT FLAME RETARDANT THERMOPLASTIC STRUCTURES SCHNELLER LLC (US) 2021-06-30 EP claimed
CN-112142962-A Preparation method and application of high molecular weight transparent polyester 武汉科技大学 2020-12-29 CN claimed
EP-1973884-B1 NOVEL HETEROCYCLES ORCHID PHARMA LTD (IN) 2016-08-03 EP claimed
US-20150322094-A1 USE OF SUBSTITUTED 2,3-DIHYDRO-1-BENZOFURAN-4-CARBOXYLIC ACIDS OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS BAYER CROPSCIENCE AG (DE) 2015-11-12 US claimed
EP-2892343-A1 USE OF SUBSTITUTED 2,3-DIHYDRO-1-BENZOFURAN-4-CARBOXYLIC ACIDS OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS Bayer CropScience AG (DE) 2015-07-15 EP claimed
WO-2014037349-A1 USE OF SUBSTITUTED 2,3-DIHYDRO-1-BENZOFURAN-4-CARBOXYLIC ACIDS OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS BAYER CROPSCIENCE AG (DE) 2014-03-13 WO claimed
CN-102584651-B Reduction method of sulfoacid UNIV ZHEJIANG 2013-12-18 CN claimed
CN-102584651-A Reduction method of sulfoacid UNIV ZHEJIANG 2012-07-18 CN claimed
EP-2245017-A2 NOVEL HETEROCYCLES Orchid Research Laboratories Limited (IN) 2010-11-03 EP claimed
WO-2009095773-A2 NOVEL HETEROCYCLES ORCHID RESEARCH LABORATORIES LIMITED (IN) 2009-08-06 WO claimed
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US claimed
CN-100339767-C Resist compositions WAKO PURE CHEM IND LTD (JP) 2007-09-26 CN claimed
US-6949329-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-09-27 US claimed
CN-1633628-A Resist compositions WAKO PURE CHEM IND LTD (JP) 2005-06-29 CN claimed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US claimed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP claimed
US-20030017425-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-01-23 US claimed
JP-2169561-A None JP disclosed
JP-H02169561-A PRODUCTION OF 3-TRIFLUOROMETHYLBENZENE SULFONYL CHLORIDES MITSUI TOATSU CHEM INC 1990-06-29 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150322094-A1 USE OF SUBSTITUTED 2,3-DIHYDRO-1-BENZOFURAN-4-CARBOXYLIC ACIDS OR SALTS THEREOF AS ACTIVE SUBSTANCES AGAINST ABIOTIC PLANT STRESS CAT, HSF1, HPD CA1 1091/4885CA2 341/4885MMP1 3742/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.