SCHEMBL1896570

SCHEMBL1896570

C=COC(=O)c1ccccc1CCO

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
LMNA P02545 2/20 0.44
CYP3A4 P08684 2/20 0.42
PTPN1 P18031 2/20 0.39
MAPT P10636 1/20 0.39
FOLH1 Q04609 1/20 0.39
KMT2A Q03164 1/20 0.38
TSHR P16473 3/20 0.37
HSD17B10 Q99714 1/20 0.37
SCN1A P35498 4/20 0.36
SCN2A Q99250 4/20 0.36
SCN3A Q9NY46 4/20 0.36
PTGS2 P35354 1/20 0.35
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
DHODH Q02127 1/20 0.34
POLB P06746 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1896070 0.85 ALDH1A1 (0.43) ALDH1A1LMNACYP3A4MAPTFOLH1
SCHEMBL9251505 0.83 CYP3A4 (0.44) ALDH1A1LMNACYP3A4TSHRHSD17B10
SCHEMBL7576211 0.83 ALDH1A1 (0.68) ALDH1A1LMNACYP3A4MAPTFOLH1
SCHEMBL985791 0.83 THRA (0.48) ALDH1A1LMNACYP3A4KMT2ATSHR
SCHEMBL6551352 0.81 CYP3A4 (0.47) ALDH1A1LMNACYP3A4MAPTKMT2A
SCHEMBL1898068 0.80 TSHR (0.47) ALDH1A1LMNACYP3A4MAPTKMT2A
SCHEMBL29912725 0.80 CYP3A4 (0.46) ALDH1A1LMNACYP3A4MAPTKMT2A
SCHEMBL15175 0.80 CYP3A4 (0.55) ALDH1A1LMNACYP3A4TSHRHSD17B10
Alcohol SCHEMBL1567009 0.79 TSHR (0.52) ALDH1A1LMNACYP3A4TSHRHSD17B10
SCHEMBL1897799 0.79 SCN1A (0.49) ALDH1A1LMNACYP3A4PTPN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-4192684-A Photosensitive compositions containing hydrogenated 1,2-polybutadiene ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-03-11 US disclosed
US-4006024-A Photosensitive compositions comprising a polyester-polyether block polymer ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) 1977-02-01 US disclosed
US-3960572-A Photosensitive compositions comprising a polyester-polyether block polymer ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) 1976-06-01 US disclosed