Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 5/20 | 0.33 |
| ▸ | FAAH | O00519 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.31 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.30 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1898638 | 0.83 | CYP2C19 (0.42) | CYP3A4CYP2C9CYP2C19CYP2D6TDP1 | |
| SCHEMBL1897655 | 0.74 | CNR2 (0.32) | CYP3A4CYP2C9CYP2C19CYP2D6TDP1 | |
| SCHEMBL7714268 | 0.73 | — | — | |
| SCHEMBL24950179 | 0.70 | ALDH1A1 (0.34) | CYP3A4CYP2C9CYP2C19CYP2D6TDP1 | |
| SCHEMBL19779575 | 0.70 | ALDH1A1 (0.42) | CYP3A4CYP2C9CYP2C19CYP2D6TDP1 | |
| SCHEMBL1898312 | 0.70 | CNR2 (0.36) | CYP3A4CNR2FAAHALDH1A1CNR1 | |
| SCHEMBL1902158 | 0.68 | CYP3A4 (0.36) | CYP3A4CYP2C9CYP2C19CYP2D6TDP1 | |
| SCHEMBL1397066 | 0.67 | KDM4E (0.40) | CNR2FAAHALDH1A1CNR1P2RX7 | |
| SCHEMBL1397070 | 0.67 | EPHX2 (0.39) | CYP3A4CNR2FAAHALDH1A1LMNA | |
| SCHEMBL1900001 | 0.67 | ALDH1A1 (0.36) | CYP3A4CYP2C9CYP2C19CYP2D6ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | claimed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |