SCHEMBL1897333

SCHEMBL1897333

C=COC(=O)c1ccccc1[Si](C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.40
TSHR P16473 7/20 0.35
ALDH1A1 P00352 6/20 0.35
HSD17B10 Q99714 4/20 0.35
LMNA P02545 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2C19 P33261 1/20 0.34
CFTR P13569 1/20 0.33
KDM4E B2RXH2 4/20 0.33
POLB P06746 1/20 0.33
ATM Q13315 1/20 0.33
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TP53 P04637 1/20 0.31
MAPK1 P28482 1/20 0.31
LIG1 P18858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898783 0.84 CYP3A4 (0.36) CYP3A4TSHRALDH1A1HSD17B10LMNA
SCHEMBL1896097 0.82 CYP3A4 (0.40) CYP3A4TSHRALDH1A1HSD17B10LMNA
SCHEMBL15175 0.81 CYP3A4 (0.55) CYP3A4TSHRALDH1A1HSD17B10LMNA
SCHEMBL9716919 0.80 LMNA (0.41) CYP3A4TSHRALDH1A1HSD17B10LMNA
Ethylene SCHEMBL29113890 0.79 CYP3A4 (0.53) CYP3A4TSHRALDH1A1HSD17B10LMNA
Acetic Acid SCHEMBL27451410 0.78 CYP3A4 (0.48) CYP3A4TSHRALDH1A1HSD17B10LMNA
SCHEMBL11794205 0.77 TSHR (0.55) CYP3A4TSHRALDH1A1HSD17B10LMNA
Alcohol SCHEMBL1567009 0.77 TSHR (0.52) CYP3A4TSHRALDH1A1HSD17B10LMNA
SCHEMBL182408 0.77 NPC1 (0.46) CYP3A4TSHRALDH1A1LMNAKMT2A
SCHEMBL19506917 0.76 CYP3A4 (0.46) CYP3A4TSHRALDH1A1HSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed