SCHEMBL1897668

SCHEMBL1897668

C=Cc1ccccc1C(=O)OC1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.42
CYP19A1 P11511 2/20 0.42
CNR2 P34972 4/20 0.35
FAAH O00519 2/20 0.35
HSD11B1 P28845 3/20 0.34
ALDH1A1 P00352 2/20 0.33
KDM4E B2RXH2 2/20 0.33
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
TSHR P16473 1/20 0.33
ALOX12 P18054 1/20 0.33
HTT P42858 1/20 0.33
ATM Q13315 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CYP3A4 P08684 3/20 0.32
CYP2C9 P11712 2/20 0.32
CYP2C19 P33261 2/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898312 0.85 CNR2 (0.36) CYP17A1CYP19A1CNR2FAAHHSD11B1
SCHEMBL1397066 0.80 KDM4E (0.40) CYP17A1CYP19A1CNR2FAAHALDH1A1
SCHEMBL6068257 0.77 CYP17A1 (0.49) CYP17A1CYP19A1FAAHHSD11B1TSHR
SCHEMBL16346925 0.77 CYP17A1 (0.41) CYP17A1CYP19A1ALDH1A1MAPTKMT2A
SCHEMBL17358250 0.76 CYP17A1 (0.44) CYP17A1CYP19A1CNR2FAAHHSD11B1
SCHEMBL24305773 0.76 PTGS2 (0.39) CYP17A1CYP19A1ALDH1A1KDM4EMAPT
SCHEMBL17358257 0.75 CA1 (0.54) CYP17A1CYP19A1CNR2FAAHHSD11B1
SCHEMBL1898213 0.75 SCN1A (0.45) CYP19A1ALDH1A1KDM4ETSHRHSD17B10
SCHEMBL1897426 0.74 SCN1A (0.44) CYP19A1ALDH1A1KDM4ENPSR1CYP3A4
SCHEMBL1397070 0.74 EPHX2 (0.39) CNR2FAAHHSD11B1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed