SCHEMBL17358257

SCHEMBL17358257

CC1(OC(=O)c2ccccc2S(N)(=O)=O)C2CC3CC(C2)CC1C3

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 7/20 0.54
CA2 P00918 7/20 0.54
CA9 Q16790 6/20 0.54
CA5A P35218 1/20 0.54
CYP17A1 P05093 2/20 0.43
CYP19A1 P11511 2/20 0.43
P2RX4 Q99571 1/20 0.38
P2RX7 Q99572 1/20 0.38
ALDH1A1 P00352 2/20 0.34
LMNA P02545 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
KDM4E B2RXH2 2/20 0.33
HSD11B1 P28845 2/20 0.33
FAAH O00519 1/20 0.32
CNR2 P34972 1/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17358250 0.78 CYP17A1 (0.44) CYP17A1CYP19A1P2RX7ALDH1A1LMNA
SCHEMBL6068257 0.76 CYP17A1 (0.49) CYP17A1CYP19A1LMNAHSD11B1FAAH
SCHEMBL1897668 0.75 CYP17A1 (0.42) CYP17A1CYP19A1ALDH1A1LMNACYP3A4
SCHEMBL17358252 0.75 CA1 (0.54) CA1CA2CA9CA5AP2RX4
SCHEMBL9368882 0.75 CA1 (0.57) CA1CA2CA9CA5ACYP2C9
SCHEMBL30362278 0.71 CA1 (1.00) CA1CA2CA9CA5AALDH1A1
SCHEMBL2181057 0.71 CA1 (1.00) CA1CA2CA9CA5AALDH1A1
SCHEMBL10087719 0.70 CYP17A1 (0.41) CA1CA2CA9CYP17A1CYP19A1
SCHEMBL16518847 0.68 CYP17A1 (0.44) CYP17A1CYP19A1LMNAKDM4EMAPT
SCHEMBL178358 0.68 LCK (0.41) CYP17A1CYP19A1ALDH1A1LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9235118-B1 Patterning methods and methods of making a photoresist composition using a photoresist additive TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2016-01-12 US disclosed
US-20150370164-A1 Patterning Methods and Methods of Making a Photoresist Composition Using a Photoresist Additive TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2015-12-24 US disclosed