SCHEMBL1900169

SCHEMBL1900169

C=Cc1ccc(C(=O)OC2COC(=O)C2)cc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 5/20 0.39
PTPN2 P17706 4/20 0.39
PTPRF P10586 1/20 0.39
PTPN6 P29350 2/20 0.38
PTPN11 Q06124 2/20 0.38
HTT P42858 1/20 0.38
XPO1 O14980 1/20 0.36
SCN1A P35498 1/20 0.34
SCN2A Q99250 1/20 0.34
SCN3A Q9NY46 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
POLB P06746 1/20 0.33
TAS1R3 Q7RTX0 1/20 0.33
TAS1R1 Q7RTX1 1/20 0.33
RAB9A P51151 2/20 0.33
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
STS P08842 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1899821 0.86 PTPN1 (0.40) PTPN1PTPN2PTPRFPTPN6PTPN11
SCHEMBL1900558 0.86 POLB (0.40) PTPN1PTPN2PTPRFPTPN6PTPN11
SCHEMBL27598256 0.81 CHRNA7 (0.49) PTPN1PTPN2PTPRFSCN1ASCN2A
SCHEMBL2696973 0.81 CHRNA7 (0.49) PTPN1PTPN2PTPRFSCN1ASCN2A
SCHEMBL5582384 0.81 CHRNA7 (0.49) PTPN1PTPN2PTPRFSCN1ASCN2A
SCHEMBL9814417 0.76 PTPN1 (0.38) PTPN1PTPN2PTPRFPTPN6PTPN11
SCHEMBL471778 0.74 PTPN1 (0.38) PTPN1PTPN2PTPRFPTPN6PTPN11
SCHEMBL27834872 0.74 STS (0.40) PTPN1PTPN2PTPRFHTTSCN1A
SCHEMBL18288929 0.74 MAPT (0.44) PTPN1PTPN2PTPRFHTTSCN1A
SCHEMBL512370 0.72 XPO1 (0.39) PTPN1HTTXPO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed