SCHEMBL1900445

SCHEMBL1900445

O=Cc1ccc(C=Cc2cc[n+](CCO)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHAT P28329 2/20 0.50
ALDH1A1 P00352 3/20 0.48
KMT2A Q03164 2/20 0.48
MEN1 O00255 1/20 0.48
USP2 O75604 1/20 0.48
LMNA P02545 1/20 0.48
MAPT P10636 1/20 0.48
CRHBP P24387 1/20 0.48
RAB9A P51151 1/20 0.48
CRHR2 Q13324 1/20 0.48
ALDH5A1 P51649 1/20 0.40
ABAT P80404 1/20 0.40
KDM4E B2RXH2 2/20 0.38
KDM4A O75164 2/20 0.38
KDM2A Q9Y2K7 2/20 0.38
CHRM2 P08172 1/20 0.37
CHRM4 P08173 1/20 0.37
CHRM5 P08912 1/20 0.37
CHRM1 P11229 1/20 0.37
CHRM3 P20309 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9455162 1.00 CHAT (0.50) CHATALDH1A1KMT2AMEN1USP2
Hydrochloric Acid SCHEMBL10347871 0.98 CHAT (0.49) CHATALDH1A1KMT2AMEN1USP2
Hydrochloric Acid SCHEMBL10347872 0.98 CHAT (0.49) CHATALDH1A1KMT2AMEN1USP2
SCHEMBL9455275 0.81 KDM4A (0.49) CHATALDH1A1KMT2AMEN1LMNA
SCHEMBL9455279 0.81 KDM4A (0.49) CHATALDH1A1KMT2AMEN1LMNA
SCHEMBL8436412 0.79 ALDH5A1 (0.35) CHATALDH1A1KMT2AMEN1USP2
SCHEMBL9454997 0.78 RAB9A (0.45) CHATALDH1A1KMT2AMEN1USP2
SCHEMBL9454991 0.78 RAB9A (0.45) CHATALDH1A1KMT2AMEN1USP2
SCHEMBL9455241 0.78 KDM4A (0.58) CHATALDH1A1KMT2AMEN1LMNA
SCHEMBL9455236 0.78 KDM4A (0.58) CHATALDH1A1KMT2AMEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113195058-B Composition comprising a modified photodimerizable polymer and an alkaline agent and/or an aminoalkoxysilane derivative and a method of treatment for carrying out the composition 莱雅公司 2025-01-03 CN disclosed
EP-4452211-A1 PROCESS FOR REMOVING MAKEUP FROM KERATIN FIBRES WHICH HAVE BEEN TREATED BEFOREHAND WITH A COMPOSITION COMPRISING A PHOTOCROSSLINKABLE POLYMER L'OREAL (FR) 2024-10-30 EP disclosed
EP-4452217-A1 PHOTODIMERIZABLE POLYMERS COMPRISING AT LEAST ONE POLYOXYALKYLENE GROUP, COMPOSITION COMPRISING SAME AND COSMETIC TREATMENT PROCESS L'OREAL (FR) 2024-10-30 EP disclosed
WO-2024184235-A1 PROCESS FOR TREATING KERATIN FIBRES USING A CROSSLINKABLE COMPOUND, A POLYMERIC PHOTOINITIATOR AND LIGHT IRRADIATION L'OREAL (FR) 2024-09-12 WO disclosed
EP-4229482-B1 POLYVINYL ACETATE BASED PHOTOPOLYMER SHOWA CHEM (JP) 2024-09-11 EP disclosed
CN-118414143-A Composition comprising a photo-crosslinkable polymer having hydrophobic groups and a colorant 莱雅公司 2024-07-30 CN disclosed
CN-118414142-A Method for removing makeup from keratin fibres that have been pretreated with a composition comprising a photocrosslinkable polymer 莱雅公司 2024-07-30 CN disclosed
CN-118414144-A Photodimerizable polymers comprising at least one polyoxyalkylene group, compositions comprising same, and cosmetic treatment methods 欧莱雅 2024-07-30 CN disclosed
CN-116348817-B Polyvinyl acetate based photopolymer 昭和化工株式会社 2024-05-07 CN disclosed
US-11860539-B2 Polyvinyl acetate based photopolymer SHOWA KAKO CORPORATION (JP) 2024-01-02 US disclosed
EP-0252151-B1 PHOTOSENSITIVE MATERIAL FOR SCREEN PROCESS Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1993-04-14 EP disclosed
EP-0252150-B1 PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1992-12-30 EP disclosed
EP-0252152-B1 PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1992-05-13 EP disclosed
EP-0415302-A2 Graft polymers with unsaturated side chains, light sensitive compositions containing them and coating composition with these polymers HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-06 EP disclosed
US-4920030-A Containing photocrosslinkable polyvinyl alcohol GENERAL DIRECTOR OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1990-04-24 US disclosed
EP-0252150-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR SCREEN PROCESS Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1988-01-13 EP disclosed
EP-0252151-A1 PHOTOSENSITIVE MATERIAL FOR SCREEN PROCESS Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1988-01-13 EP disclosed
EP-0252152-A1 PHOTOSENSITIVE EMULSION FOR COATING PLASTIC FILM Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1988-01-13 EP disclosed
US-4339524-A VINYL ACETATE, VINYL ALCOHOL ACETAL AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY (JP) 1982-07-13 US disclosed
US-4272620-A Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1981-06-09 US disclosed