Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30525802 | 0.95 | POLB (0.37) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL526020 | 0.90 | POLB (0.46) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| Phthalic Acid SCHEMBL29089131 | 0.83 | KDM4E (0.39) | POLBKDM4ESMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL31534014 | 0.79 | POLB (0.32) | POLB | |
| SCHEMBL28658121 | 0.77 | POLB (0.40) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL1899739 | 0.77 | MAPK1 (0.41) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL685643 | 0.75 | MAPK1 (0.45) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL12123893 | 0.75 | TDP1 (0.42) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL1899432 | 0.74 | POLB (0.54) | POLBKDM4ESMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL7975297 | 0.74 | MAPK1 (0.47) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122011271-A | Acrylic copolymer, preparation method and application thereof and photoresist composition | 福建泓光半导体材料有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-120118458-A | Curable composition, resin, and cured product | 东京应化工业株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-119937242-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-7223516-B2 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |
| US-7223516-B2 | Positive type photoresist composition | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |