SCHEMBL1901033

SCHEMBL1901033

c1ccn(C2CCCCC2)c1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.41
DRD4 P21917 1/20 0.41
DRD3 P35462 1/20 0.41
PKM P14618 1/20 0.35
SLC18A3 Q16572 1/20 0.34
GAA P10253 1/20 0.34
CYP3A4 P08684 2/20 0.32
CYP2C19 P33261 2/20 0.32
HPGD P15428 1/20 0.32
ALDH1A1 P00352 3/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
CYP2C9 P11712 1/20 0.32
KMT2A Q03164 1/20 0.32
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5601933 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5601787 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5601758 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5600054 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5599984 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5601528 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5602242 1.00 DRD2 (0.41) DRD2DRD4DRD3PKMSLC18A3
Hydrochloric Acid SCHEMBL27290402 0.97 DRD2 (0.39) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL260416 0.97 DRD2 (0.42) DRD2DRD4DRD3PKMSLC18A3
SCHEMBL5603702 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118085333-A Preparation method of high-conductivity hydrogel applicable to flexible sensor 江南大学 2024-05-28 CN claimed
CN-110746938-B Cellulose/polypyrrole supported composite phase change heat storage material and preparation method thereof 东华大学 2021-05-11 CN claimed
CN-110746938-A Cellulose/polypyrrole supported composite phase change heat storage material and preparation method thereof 东华大学 2020-02-04 CN claimed
CN-110412838-A A kind of highly selective stripper, preparation method and application SHANGHAI SINYANG SEMICONDUCTOR MAT CO LTD 2019-11-05 CN claimed
CN-110361941-A A kind of positive photoresist stripper, preparation method and application 上海新阳半导体材料股份有限公司 2019-10-22 CN claimed
CN-107551825-B High temperature resistant organic solvent-resistant type separation membrane material, seperation film and preparation method thereof 四川大学 2019-10-15 CN claimed
CN-110325067-A Conductive glove and method for producing same 锦湖石油化学株式会社 2019-10-11 CN claimed
CN-110262199-A A kind of negtive photoresist stripper, preparation method and application 上海新阳半导体材料股份有限公司 2019-09-20 CN claimed
CN-109867804-A A kind of preparation method of no interface thermoplastic heat curable type polyimide composite film 宁波激智科技股份有限公司 2019-06-11 CN claimed
CN-108987586-A A kind of perovskite solar cell module and preparation method thereof 颜步 2018-12-11 CN claimed
CN-107204565-A The saturated absorbing body device and purposes of GeSe two-dimensional layers semiconductor and composition 浙江大学 2017-09-26 CN claimed
CN-107121901-A A kind of rich water base cleaning liquid composition 昆山欣谷微电子材料有限公司 2017-09-01 CN claimed
CN-106919013-A A kind of cleaning fluid of the removal photoresistance residue of low etching 安集微电子(上海)有限公司 2017-07-04 CN claimed
CN-106687540-A Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating 富士胶片亨特化学制品美国有限公司 2017-05-17 CN claimed
WO-2011052941-A2 ETCHING COMPOSITION FOR TEXTURING CRYSTALLINE SILICON-BASED WAFER DONGWOO FINE-CHEM CO., LTD. (KR) 2011-05-05 WO claimed
US-7276567-B2 Heterocyclic substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. (US) 2007-10-02 US claimed
EP-1195641-B1 Film/Screen system and image-forming system for use in direct X-ray applications AGFA GEVAERT (BE) 2004-12-29 EP claimed
US-6528227-B2 Radiation-sensitive black-and-white silver halide photographic material in contact with screen sheets designed to emit electrons when exposed to X-rays with an energy greater than or equal to 10 kVp; radiology AGFA-GEVAERT (BE) 2003-03-04 US claimed
US-20020076640-A1 Film/screen system and image-forming system for use in direct X-ray applications AGFA-GEVAERT (BE) 2002-06-20 US claimed
EP-1195641-A1 Film/Screen system and image-forming system for use in direct X-ray applications Agfa-Gevaert (BE) 2002-04-10 EP claimed