SCHEMBL1901260

SCHEMBL1901260

C=Cc1ccc(C(Br)CCO)cc1

nearest known ligand 0.42

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
TAS1R3 Q7RTX0 1/20 0.35
TAS1R1 Q7RTX1 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27640198 0.80 ALDH1A1 (0.46) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL28110490 0.80 ALDH1A1 (0.46) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL10619292 0.78 ALDH1A1 (0.48) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL5203081 0.77 ALDH1A1 (0.42) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL6811412 0.76 ALDH1A1 (0.46) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL27660986 0.76 ALDH1A1 (0.46) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL6632793 0.75 HTR2A (0.38)
SCHEMBL27555588 0.74 ALDH1A1 (0.44) ALDH1A1TAS1R3TAS1R1TDP1TSHR
SCHEMBL12385228 0.74 ALDH1A1 (0.35) ALDH1A1
SCHEMBL3415297 0.74 AOC3 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
CN-100503666-C Hyperbranched polymer, method for producing same, and resist composition containing same LION CORP (JP) 2009-06-24 CN disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed
US-20070148585-A1 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer LION CORPORATION. 2007-06-28 US disclosed
CN-1898281-A Hyperbranched polymer, method for producing same, and resist composition containing same LION CORP (JP) 2007-01-17 CN disclosed
EP-1698645-A1 HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER Lion Corporation (JP) 2006-09-06 EP disclosed