SCHEMBL19042385

SCHEMBL19042385

NS(=O)(=O)C(F)(F)C(=O)NC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 6/20 0.48
EPHX1 P07099 4/20 0.48
SIGMAR1 Q99720 2/20 0.41
CA2 P00918 2/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA9 Q16790 1/20 0.41
STS P08842 1/20 0.40
LMNA P02545 2/20 0.40
ALDH1A1 P00352 2/20 0.40
MEN1 O00255 1/20 0.40
MAPT P10636 1/20 0.40
KMT2A Q03164 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
POLB P06746 1/20 0.40
THRB P10828 1/20 0.40
HTT P42858 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19863276 0.85 EPHX2 (0.50) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL19862487 0.85 EPHX2 (0.50) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL10272971 0.85 EPHX2 (0.50) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL15512063 0.85 EPHX2 (0.50) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL16604547 0.80 EPHX2 (0.44) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL10284312 0.80 EPHX2 (0.44) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL7353899 0.78 EPHX2 (0.59) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL11959258 0.75 EPHX2 (0.55) EPHX2EPHX1SIGMAR1MEN1KMT2A
SCHEMBL29103915 0.75 EPHX2 (0.55) EPHX2EPHX1LMNAALDH1A1MEN1
SCHEMBL15114230 0.75 EPHX2 (0.50) EPHX2EPHX1SIGMAR1LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20170184962-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184964-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed