⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Tetrachloride SCHEMBL10772853 | 0.57 | ALDH1A1 (0.57) | — | |
| SCHEMBL1673499 | 0.53 | — | — | |
| SCHEMBL718700 | 0.53 | — | — | |
| SCHEMBL9998761 | 0.53 | — | — | |
| SCHEMBL6842946 | 0.52 | — | — | |
| SCHEMBL10692677 | 0.50 | — | — | |
| SCHEMBL1094501 | 0.50 | — | — | |
| SCHEMBL5085713 | 0.50 | — | — | |
| Trichloromonofluoromethane SCHEMBL9346668 | 0.50 | ALDH1A1 (0.30) | — | |
| SCHEMBL9231045 | 0.50 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270096-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MAT US LLC (US) | 2025-08-28 | — | — | US | claimed |
| US-12297115-B2 | High temperature atomic layer deposition of silicon-containing film | VERSUM MATERIALS US, LLC (US) | 2025-05-13 | — | — | US | claimed |
| US-20210380418-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MATERIALS US, LLC (US) | 2021-12-09 | — | — | US | claimed |
| US-20250270096-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MAT US LLC (US) | 2025-08-28 | — | — | US | disclosed |
| US-12297115-B2 | High temperature atomic layer deposition of silicon-containing film | VERSUM MATERIALS US, LLC (US) | 2025-05-13 | — | — | US | disclosed |
| US-20210380418-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILM | VERSUM MATERIALS US, LLC (US) | 2021-12-09 | — | — | US | disclosed |
| US-20200339610-A1 | ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS | AMERICAN AIR LIQUID INC (US) | 2020-10-29 | — | — | US | disclosed |
| US-20190256532-A1 | ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS | AIR LIQUIDE AMERICAN (US) | 2019-08-22 | — | — | US | disclosed |
| US-20180202042-A1 | ALKYLAMINO-SUBSTITUTED HALOCARBOSILANE PRECURSORS | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2018-07-19 | — | — | US | disclosed |
| US-20170190720-A1 | ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS | AMERICAN AIR LIQUIDE, INC. | 2017-07-06 | — | — | US | disclosed |