SCHEMBL19102451

SCHEMBL19102451

CCC(C)(C)C(=O)OC12CC3CCC1C(O)CC(C3)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10204838 0.78 CYP17A1 (0.33) ALDH1A1
SCHEMBL2733974 0.75 CYP17A1 (0.33) ALDH1A1
SCHEMBL17750342 0.74 ALDH1A1 (0.31) ALDH1A1
SCHEMBL683013 0.74 ALDH1A1 (0.31) ALDH1A1
SCHEMBL13430236 0.74
SCHEMBL106919 0.74 CYP19A1 (0.46) ALDH1A1HTT
SCHEMBL13219532 0.73 ALDH1A1 (0.30) ALDH1A1
SCHEMBL2741160 0.72 KMT2A (0.31)
SCHEMBL18068655 0.72 EPHX2 (0.32)
SCHEMBL2607843 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9703196-B2 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same FUJIFILM CORPORATION (JP) 2017-07-11 US disclosed