Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH2 | P25021 | 1/20 | 0.40 |
| ▸ | HRH1 | P35367 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | HRH3 | Q9Y5N1 | 6/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21125866 | 0.90 | HRH2 (0.40) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL22743444 | 0.84 | HRH2 (0.42) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL6606038 | 0.83 | HRH2 (0.54) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL16062671 | 0.82 | HRH2 (0.45) | HRH2HRH1MEN1KMT2ATHRB | |
| SCHEMBL22743451 | 0.77 | HRH2 (0.39) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL14651718 | 0.77 | HRH2 (0.38) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL29001314 | 0.77 | HRH2 (0.54) | HRH2HRH1THRBLMNA | |
| SCHEMBL16062670 | 0.77 | HRH2 (0.40) | HRH2HRH1MEN1KMT2AMAPT | |
| SCHEMBL1341702 | 0.77 | TSHR (0.43) | HRH2HRH1MEN1KMT2AALDH1A1 | |
| SCHEMBL16062677 | 0.76 | LMNA (0.39) | HRH2HRH1MEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11745302-B2 | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process | APPLIED MATERIALS, INC. (US) | 2023-09-05 | — | — | US | disclosed |
| US-10391605-B2 | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process | APPLIED MATERIALS, INC. (US) | 2019-08-27 | — | — | US | disclosed |
| US-20170203408-A1 | METHOD AND APPARATUS FOR FORMING POROUS ADVANCED POLISHING PADS USING AN ADDITIVE MANUFACTURING PROCESS | APPLIED MATERIALS, INC. | 2017-07-20 | — | — | US | disclosed |