SCHEMBL191797

SCHEMBL191797

CCc1c[c]c(C)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15064094 0.82 EGFR (0.37)
SCHEMBL191629 0.81 LPL (0.39)
SCHEMBL596190 0.80
SCHEMBL597407 0.78
SCHEMBL2594932 0.78
SCHEMBL193524 0.78 SKP2 (0.44)
SCHEMBL192638 0.78 ALDH1A1 (0.44)
SCHEMBL192917 0.75 TP53 (0.36)
SCHEMBL16494971 0.75 HRH3 (0.48)
SCHEMBL2299951 0.75 AGXT (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2994448-A1 IMPROVEMENTS IN OR RELATING TO ORGANIC COMPOUNDS Givaudan SA (CH) 2016-03-16 EP claimed
WO-2014180952-A1 IMPROVEMENTS IN OR RELATING TO ORGANIC COMPOUNDS GIVAUDAN SA (CH) 2014-11-13 WO claimed
EP-1199310-B1 PROCESS FOR THE PREPARATION OF CONDENSED PHOSPHORIC ESTERS DAIHACHI CHEM IND (JP) 2003-11-05 EP claimed
CN-114303096-A Film-forming composition for lithography, resist pattern formation method, circuit pattern formation method, and purification method 三菱瓦斯化学株式会社 2022-04-08 CN disclosed
WO-2021039843-A1 COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD AND PURIFICATION METHOD 三菱瓦斯化学株式会社 2021-03-04 WO disclosed
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US disclosed
EP-3760611-A1 COMPOUND, RESIN, COMPOSITION AND FILM-FORMING MATERIAL FOR LITHOGRAPHY USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP disclosed
EP-2841429-B1 TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES SUMITOMO CHEMICAL CO (JP) 2020-10-21 EP disclosed
CN-111788176-A Compound, resin, composition, and film-forming material for lithography using same 三菱瓦斯化学株式会社 2020-10-16 CN disclosed
US-20200172470-A1 NOVEL (POLY)AMINE COMPOUND, RESIN AND CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-06-04 US disclosed
EP-3659996-A1 NOVEL (POLY)AMINE COMPOUND, RESIN, AND CURED PRODUCT Mitsubishi Gas Chemical Company, Inc. (JP) 2020-06-03 EP disclosed
CN-1316989-A Optically active substituted N-aryl-o-aryloxyalkyl-carbamates BAYER AG (DE) 2001-10-10 CN disclosed
EP-1115700-A1 OPTICALLY ACTIVE SUBSTITUTED N-ARYL-O-ARYLOXYALKYL-CARBAMATES BAYER AG (DE) 2001-07-18 EP disclosed
WO-2000017157-A1 OPTICALLY ACTIVE SUBSTITUTED N-ARYL-O-ARYLOXYALKYL-CARBAMATES BAYER AKTIENGESELLSCHAFT (DE) 2000-03-30 WO disclosed
US-6022917-A Flame-retardant resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2000-02-08 US disclosed
US-5994433-A AROMATIC PHOSPHORIC ACID ESTER AND A FLUORORESIN SUCH AS POLYTETRAFLUOROETHYLENE ADDED TO A MIXTURE OF AN AROMATIC POLYCARBONATE AND A STYRENIC RESIN DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1999-11-30 US disclosed
US-5627228-A ALKYLARYL PHOSPHATE, POLYTETRAFLOROETHYLENE, POLYCARBONATE, STYRENE POLYMERS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-05-06 US disclosed
EP-0682081-A1 Flame-retardant resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-15 EP disclosed
US-5092918-A Alkylenedicarboxylate Crystallization Inhibition MONSANTO COMPANY (US) 1992-03-03 US disclosed
US-4501746-A HERBICIDES; PLANT GROWTH REGULATORS ELI LILLY AND COMPANY (US) 1985-02-26 US disclosed