SCHEMBL191883

SCHEMBL191883

C[C](C)C12CCC(CC1)C2

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
HTT P42858 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3813670 0.79 ALDH1A1 (0.35) ALDH1A1HTTNPSR1
SCHEMBL9512535 0.79 ALDH1A1 (0.42) ALDH1A1HTTNPSR1KMT2A
SCHEMBL16090812 0.74
SCHEMBL3079757 0.72 ALDH1A1 (0.41) ALDH1A1HTTNPSR1KMT2A
SCHEMBL7760564 0.71 ALDH1A1 (0.41) ALDH1A1HTTNPSR1KMT2A
SCHEMBL40512 0.71 ALDH1A1 (0.42) ALDH1A1
SCHEMBL245977 0.71 ALDH1A1 (0.37) ALDH1A1HTTNPSR1KMT2A
SCHEMBL218350 0.70 ALDH1A1 (0.40) ALDH1A1HTTNPSR1KMT2A
SCHEMBL15515009 0.70 ALDH1A1 (0.40) ALDH1A1HTTNPSR1KMT2A
SCHEMBL152754 0.70 ALDH1A1 (0.40) ALDH1A1HTTNPSR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2468780-B1 Copolymer and top coating composition JSR CORP (JP) 2013-11-13 EP disclosed
US-8580482-B2 Copolymer and top coating composition JSR CORPORATION (JP) 2013-11-12 US disclosed
US-8507189-B2 Upper layer film forming composition and method of forming photoresist pattern JSR CORPORATION (JP) 2013-08-13 US disclosed
US-8501389-B2 Upper layer-forming composition and resist patterning method JSR CORPORATION (JP) 2013-08-06 US disclosed
EP-1806370-B1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR CORP (JP) 2013-05-22 EP disclosed
EP-2277929-B1 Copolymer and top coating composition JSR CORP (JP) 2012-11-21 EP disclosed
EP-2468780-A1 Copolymer and top coating composition JSR Corporation (JP) 2012-06-27 EP disclosed
EP-1950610-B1 IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR CORP (JP) 2012-05-02 EP disclosed
US-20120101205-A1 COPOLYMER AND TOP COATING COMPOSITION JSR CORPORATION (JP) 2012-04-26 US disclosed
EP-2078983-B1 COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN JSR CORP (JP) 2012-01-04 EP disclosed
US-20110262859-A1 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD JSR CORPORATION (JP) 2011-10-27 US disclosed
EP-2277929-A1 Copolymer and top coating composition JSR Corporation (JP) 2011-01-26 EP disclosed
US-20100266953-A1 COPOLYMER AND TOP COATING COMPOSITION JSR CORPORATION (JP) 2010-10-21 US disclosed
US-20100040974-A1 UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN JSR CORPORATION (JP) 2010-02-18 US disclosed
US-20100003615-A1 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD JSR CORPORATION (JP) 2010-01-07 US disclosed
EP-2078983-A1 COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN JSR Corporation (JP) 2009-07-15 EP disclosed
EP-1950610-A1 COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2008-07-30 EP disclosed
EP-1806370-A1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR Corporation (JP) 2007-07-11 EP disclosed