SCHEMBL19190077

SCHEMBL19190077

Cc1cc(C)c(CP(C(=O)c2c(C)cc(C)cc2C)c2ccccc2)c(C)c1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.39
▸ MEN1 O00255 5/20 0.37
▸ KMT2A Q03164 5/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ RAB9A P51151 3/20 0.34
▸ NPC1 O15118 2/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ HPGD P15428 1/20 0.34
▸ TSPO P30536 1/20 0.34
▸ CRHR1 P34998 2/20 0.33
▸ MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23420644 0.84 LMNA (0.40) LMNAMEN1KMT2ASMN1; SMN2RAB9A
Water SCHEMBL20943476 0.83 LMNA (0.39) LMNAMEN1KMT2ASMN1; SMN2ALDH1A1
Hypophosphorous Acid SCHEMBL31392906 0.79 LMNA (0.37) LMNAMEN1KMT2ASMN1; SMN2ALDH1A1
Phosphoric Acid SCHEMBL30173239 0.79 LMNA (0.40) LMNAMEN1KMT2ASMN1; SMN2RAB9A
SCHEMBL1978504 0.79 LMNA (0.40) LMNAMEN1KMT2ASMN1; SMN2RAB9A
SCHEMBL31070823 0.78 CYP1A2 (0.36) LMNAMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL28932486 0.78 LMNA (0.39) LMNAMEN1KMT2ASMN1; SMN2RAB9A
SCHEMBL25250098 0.77 ATM (0.40) LMNAMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL21159031 0.77 LMNA (0.36) LMNAMEN1KMT2ASMN1; SMN2ALDH1A1
SCHEMBL132877 0.77 LMNA (0.38) LMNAMEN1KMT2ASMN1; SMN2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240019781-A1 DISPERSION RESIN, PREPARATION METHOD THEREFOR AND PHOTORESIST COMPOSITION Shenzhen Brthrborder Semiconductor Materials Co., Ltd. (CN) 2024-01-18 — — US disclosed
US-11703773-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2023-07-18 — — US disclosed
US-11667762-B2 UV-initiated reactions in polymeric materials THE GENERAL HOSPITAL CORPORATION (US) 2023-06-06 — — US disclosed
EP-3260474-A1 POLYMERIZABLE LIQUID-CRYSTAL COMPOSITION DIC Corporation (JP) 2017-12-27 — — EP disclosed
EP-2399942-B1 POLYMERIZABLE LIQUID-CRYSTAL COMPOSITION DAINIPPON INK & CHEMICALS (JP) 2017-08-02 — — EP disclosed
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