SCHEMBL23420644

SCHEMBL23420644

CCP(C(=O)c1c(C)cc(C)cc1C)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.40
▸ MEN1 O00255 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ HPGD P15428 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ CRHR1 P34998 2/20 0.37
▸ ATM Q13315 1/20 0.36
▸ KDM4E B2RXH2 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ TSPO P30536 1/20 0.36
▸ RAB9A P51151 3/20 0.35
▸ NPC1 O15118 2/20 0.35
▸ POLB P06746 1/20 0.34
▸ MAPT P10636 1/20 0.34
▸ METAP2 P50579 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL20943476 0.98 LMNA (0.39) LMNAMEN1KMT2AHPGDSMN1; SMN2
Hypophosphorous Acid SCHEMBL31392906 0.94 LMNA (0.37) LMNAMEN1KMT2AHPGDSMN1; SMN2
Phosphoric Acid SCHEMBL30173239 0.94 LMNA (0.40) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL19190077 0.84 LMNA (0.39) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL25250098 0.83 ATM (0.40) LMNAMEN1KMT2ASMN1; SMN2ATM
Propane SCHEMBL28243452 0.82 MEN1 (0.40) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL1978504 0.81 LMNA (0.40) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL30883286 0.81 BCL2L1 (0.38) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL31070823 0.80 CYP1A2 (0.36) LMNAMEN1KMT2AHPGDSMN1; SMN2
SCHEMBL28932486 0.80 LMNA (0.39) LMNAMEN1KMT2AHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023233100-A1 METHOD FOR ASSEMBLING TWO SUBSTRATES BY ADHESIVE BONDING BOSTIK SA (FR) 2023-12-07 — — WO claimed
CN-116830036-A Two-component system 西托斯股份公司 2023-09-29 — — CN claimed
WO-2021105603-A1 COMPOSITION MADE FROM (METH)ACRYLATE MONOMERS BOSTIK SA (FR) 2021-06-03 — — WO claimed
CN-116615332-B Optically anisotropic laminate and optical element MITSUBISHI CHEMICAL CORP. (JP) 2026-05-26 — — CN disclosed
CN-119948372-A Optically anisotropic laminate and optical element 三菱化学株式会社 2025-05-06 — — CN disclosed
WO-2024165880-A1 UV-CURABLE INKJET INK, AND INKJET RECORDING METHOD artience株式会社 2024-08-15 — — WO disclosed
CN-118055983-A Free radical curable inkjet inks 爱克发有限公司 2024-05-17 — — CN disclosed
CN-117651706-A Free radically polymerizable monomers, free radically polymerizable compositions, methods of using free radically polymerizable compositions, polymerized compositions, and electronic articles 3M创新有限公司 2024-03-05 — — CN disclosed
CN-117616333-A Photoresist process 海立尔显示材料有限公司 2024-02-27 — — CN disclosed
WO-2024019001-A1 PHOTOCURABLE THERMALLY CONDUCTIVE COMPOSITION 東亞合成株式会社 2024-01-25 — — WO disclosed
CN-117295752-A Monomers, polymerizable compositions, and polymers derived therefrom 3M创新有限公司 2023-12-26 — — CN disclosed
CN-111148795-B Photo radical curing of silicones 3M创新有限公司 2023-06-23 — — CN disclosed
CN-115151586-A One part moisture curable resin for additive manufacturing 卡本有限公司 2022-10-04 — — CN disclosed
EP-3749700-B1 MASS FIXABLE BY ACTINIC RADIATION, AND USE OF SAID MASS DELO INDUSTRIE KLEBSTOFFE GMBH & CO KGAA (DE) 2022-03-30 — — EP disclosed
WO-2022024705-A1 ACTIVE-ENERGY-RAY-CURABLE INKJET PRINTING INK COMPOSITION サカタインクス株式会社 2022-02-03 — — WO disclosed
CN-109843825-B Coated panel and method for manufacturing coated panel 扎伊罗技术股份公司 2022-01-28 — — CN disclosed
WO-2021132693-A1 CURABLE COMPOSITION 東亞合成株式会社 2021-07-01 — — WO disclosed
WO-2021105603-A1 COMPOSITION MADE FROM (METH)ACRYLATE MONOMERS BOSTIK SA (FR) 2021-06-03 — — WO disclosed
CN-109843825-A Coated panel and method for manufacturing coated panel 扎伊罗技术股份公司 2019-06-04 — — CN disclosed
CN-108276543-A Glass lens polythiol compositions SKC株式会社 2018-07-13 — — CN disclosed
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