Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CRHR1 | P34998 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | TSPO | P30536 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.35 |
| ▸ | NPC1 | O15118 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | METAP2 | P50579 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL20943476 | 0.98 | LMNA (0.39) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| Hypophosphorous Acid SCHEMBL31392906 | 0.94 | LMNA (0.37) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| Phosphoric Acid SCHEMBL30173239 | 0.94 | LMNA (0.40) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL19190077 | 0.84 | LMNA (0.39) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL25250098 | 0.83 | ATM (0.40) | LMNAMEN1KMT2ASMN1; SMN2ATM | |
| Propane SCHEMBL28243452 | 0.82 | MEN1 (0.40) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL1978504 | 0.81 | LMNA (0.40) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL30883286 | 0.81 | BCL2L1 (0.38) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL31070823 | 0.80 | CYP1A2 (0.36) | LMNAMEN1KMT2AHPGDSMN1; SMN2 | |
| SCHEMBL28932486 | 0.80 | LMNA (0.39) | LMNAMEN1KMT2AHPGDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023233100-A1 | METHOD FOR ASSEMBLING TWO SUBSTRATES BY ADHESIVE BONDING | BOSTIK SA (FR) | 2023-12-07 | — | — | WO | claimed |
| CN-116830036-A | Two-component system | 西托斯股份公司 | 2023-09-29 | — | — | CN | claimed |
| WO-2021105603-A1 | COMPOSITION MADE FROM (METH)ACRYLATE MONOMERS | BOSTIK SA (FR) | 2021-06-03 | — | — | WO | claimed |
| CN-116615332-B | Optically anisotropic laminate and optical element | MITSUBISHI CHEMICAL CORP. (JP) | 2026-05-26 | — | — | CN | disclosed |
| CN-119948372-A | Optically anisotropic laminate and optical element | 三菱化学株式会社 | 2025-05-06 | — | — | CN | disclosed |
| WO-2024165880-A1 | UV-CURABLE INKJET INK, AND INKJET RECORDING METHOD | artience株式会社 | 2024-08-15 | — | — | WO | disclosed |
| CN-118055983-A | Free radical curable inkjet inks | 爱克发有限公司 | 2024-05-17 | — | — | CN | disclosed |
| CN-117651706-A | Free radically polymerizable monomers, free radically polymerizable compositions, methods of using free radically polymerizable compositions, polymerized compositions, and electronic articles | 3M创新有限公司 | 2024-03-05 | — | — | CN | disclosed |
| CN-117616333-A | Photoresist process | 海立尔显示材料有限公司 | 2024-02-27 | — | — | CN | disclosed |
| WO-2024019001-A1 | PHOTOCURABLE THERMALLY CONDUCTIVE COMPOSITION | 東亞合成株式会社 | 2024-01-25 | — | — | WO | disclosed |
| CN-117295752-A | Monomers, polymerizable compositions, and polymers derived therefrom | 3M创新有限公司 | 2023-12-26 | — | — | CN | disclosed |
| CN-111148795-B | Photo radical curing of silicones | 3M创新有限公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-115151586-A | One part moisture curable resin for additive manufacturing | 卡本有限公司 | 2022-10-04 | — | — | CN | disclosed |
| EP-3749700-B1 | MASS FIXABLE BY ACTINIC RADIATION, AND USE OF SAID MASS | DELO INDUSTRIE KLEBSTOFFE GMBH & CO KGAA (DE) | 2022-03-30 | — | — | EP | disclosed |
| WO-2022024705-A1 | ACTIVE-ENERGY-RAY-CURABLE INKJET PRINTING INK COMPOSITION | サカタインクス株式会社 | 2022-02-03 | — | — | WO | disclosed |
| CN-109843825-B | Coated panel and method for manufacturing coated panel | 扎伊罗技术股份公司 | 2022-01-28 | — | — | CN | disclosed |
| WO-2021132693-A1 | CURABLE COMPOSITION | 東亞合成株式会社 | 2021-07-01 | — | — | WO | disclosed |
| WO-2021105603-A1 | COMPOSITION MADE FROM (METH)ACRYLATE MONOMERS | BOSTIK SA (FR) | 2021-06-03 | — | — | WO | disclosed |
| CN-109843825-A | Coated panel and method for manufacturing coated panel | 扎伊罗技术股份公司 | 2019-06-04 | — | — | CN | disclosed |
| CN-108276543-A | Glass lens polythiol compositions | SKC株式会社 | 2018-07-13 | — | — | CN | disclosed |