SCHEMBL19206136

SCHEMBL19206136

C[N+](CCCO)CCCO

nearest known ligand 0.39

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.37
LMNA P02545 2/20 0.35
TSHR P16473 2/20 0.35
HSD17B10 Q99714 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5782637 0.79
SCHEMBL7245802 0.77
SCHEMBL10629424 0.69 TSHR (0.35) ALDH1A1SMN1; SMN2LMNATSHRHSD17B10
SCHEMBL19206144 0.69
SCHEMBL9663850 0.67 LMNA (0.45) ALDH1A1SMN1; SMN2LMNATSHRHSD17B10
SCHEMBL10446254 0.67
1,4-Butanediol SCHEMBL10709999 0.62
1,3-Propanediol SCHEMBL10605693 0.62
1,4-Butanediol SCHEMBL6708433 0.62
1,3-Propanediol SCHEMBL17164788 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11168406-B2 Leveler compositions for use in copper deposition in manufacture of microelectronics MACDERMID ENTHONE INC. (US) 2021-11-09 US claimed
US-20200063280-A1 Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics MACDERMID ENTHONE INC. 2020-02-27 US claimed
EP-3414277-A1 LEVELER COMPOSITIONS FOR USE IN COPPER DEPOSITION IN MANUFACTURE OF MICROELECTRONICS MacDermid Enthone Inc. (US) 2018-12-19 EP claimed
WO-2017139087-A1 LEVELER COMPOSITIONS FOR USE IN COPPER DEPOSITION IN MANUFACTURE OF MICROELECTRONICS MACDERMID ENTHONE INC. (US) 2017-08-17 WO claimed
US-20170233883-A1 Leveler Compositions for Use in Copper Deposition in Manufacture of Microelectronics CITIBANK, N.A. 2017-08-17 US claimed
US-11168406-B2 Leveler compositions for use in copper deposition in manufacture of microelectronics MACDERMID ENTHONE INC. (US) 2021-11-09 US disclosed
US-20210310141-A1 Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics MACDERMID ENTHONE INC (US) 2021-10-07 US disclosed
US-20200063280-A1 Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics MACDERMID ENTHONE INC. 2020-02-27 US disclosed
US-20170233883-A1 Leveler Compositions for Use in Copper Deposition in Manufacture of Microelectronics CITIBANK, N.A. 2017-08-17 US disclosed