⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19206136 | 0.77 | ALDH1A1 (0.39) | — | |
| SCHEMBL296128 | 0.75 | — | — | |
| SCHEMBL10288635 | 0.69 | — | — | |
| SCHEMBL6929384 | 0.64 | — | — | |
| SCHEMBL742932 | 0.64 | ALDH1A1 (0.41) | — | |
| SCHEMBL10699920 | 0.62 | — | — | |
| SCHEMBL4729441 | 0.58 | — | — | |
| Ethylene Glycol SCHEMBL125371 | 0.55 | — | — | |
| Ethylene Glycol SCHEMBL10902002 | 0.55 | — | — | |
| Ethylene Glycol SCHEMBL27763258 | 0.55 | TSHR (0.71) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11168406-B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | MACDERMID ENTHONE INC. (US) | 2021-11-09 | — | — | US | claimed |
| US-20200063280-A1 | Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics | MACDERMID ENTHONE INC. | 2020-02-27 | — | — | US | claimed |
| US-20170233883-A1 | Leveler Compositions for Use in Copper Deposition in Manufacture of Microelectronics | CITIBANK, N.A. | 2017-08-17 | — | — | US | claimed |
| US-6583133-B1 | Especially against Gram-positive organisms, e.g. methicillin-sensitive (MSSA) and methicillin- resistant (MRSA) staphylococci, enterococci and pneumococci | BASILEA PHARMACEUTICA AG (CH) | 2003-06-24 | — | — | US | claimed |
| EP-1090013-A1 | PROPENYL CEPHALOSPORIN DERIVATIVES | F. HOFFMANN-LA ROCHE AG (CH) | 2001-04-11 | — | — | EP | claimed |
| WO-1999067255-A1 | PROPENYL CEPHALOSPORIN DERIVATIVES | F. HOFFMANN-LA ROCHE AG (CH) | 1999-12-29 | — | — | WO | claimed |
| EP-0414952-A1 | Dithiolane derivatives | NIHON NOHYAKU CO., LTD. (JP) | 1991-03-06 | — | — | EP | claimed |
| US-11168406-B2 | Leveler compositions for use in copper deposition in manufacture of microelectronics | MACDERMID ENTHONE INC. (US) | 2021-11-09 | — | — | US | disclosed |
| US-20210310141-A1 | Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics | MACDERMID ENTHONE INC (US) | 2021-10-07 | — | — | US | disclosed |
| US-20200063280-A1 | Leveler Compositions for use in Copper Deposition in Manufacture of Microelectronics | MACDERMID ENTHONE INC. | 2020-02-27 | — | — | US | disclosed |
| US-20170233883-A1 | Leveler Compositions for Use in Copper Deposition in Manufacture of Microelectronics | CITIBANK, N.A. | 2017-08-17 | — | — | US | disclosed |
| US-6583133-B1 | Especially against Gram-positive organisms, e.g. methicillin-sensitive (MSSA) and methicillin- resistant (MRSA) staphylococci, enterococci and pneumococci | BASILEA PHARMACEUTICA AG (CH) | 2003-06-24 | — | — | US | disclosed |
| US-3998827-A | HYPOTENSIVE AGENTS | THE UPJOHN COMPANY (US) | 1976-12-21 | — | — | US | disclosed |