⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6364211 | 0.73 | — | — | |
| SCHEMBL9383231 | 0.68 | — | — | |
| SCHEMBL6364429 | 0.65 | — | — | |
| SCHEMBL3987202 | 0.60 | — | — | |
| SCHEMBL1861577 | 0.60 | — | — | |
| SCHEMBL2245111 | 0.57 | — | — | |
| SCHEMBL11183068 | 0.55 | — | — | |
| SCHEMBL36991 | 0.55 | — | — | |
| SCHEMBL23881943 | 0.52 | ALDH1A1 (0.35) | — | |
| SCHEMBL10345890 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 792 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240141087-A1 | POLYCYCLIC-OLEFINIC POLYMERS CONTAINING ACRYLATE FUNCTIONALITY WITH ACRYLATE/MALEIMIDE CROSSLINKERS AS B-STAGEABLE COMPOSITIONS FOR LOW LOSS APPLICATIONS | PROMERUS, LLC (US) | 2024-05-02 | — | — | US | claimed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | claimed |
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | claimed |
| US-20130216723-A1 | SULFONATE ESTERS AS LATENT ACID CATALYSTS | KING INDUSTRIES (US) | 2013-08-22 | — | — | US | claimed |
| US-8487071-B2 | Polyether polymer and production process thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-16 | — | — | US | claimed |
| US-8431730-B2 | Sulfonate esters as latent acid catalysts | KING INDUSTRIES (US) | 2013-04-30 | — | — | US | claimed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | claimed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | claimed |
| US-8247165-B2 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORPORATION (JP) | 2012-08-21 | — | — | US | claimed |
| EP-2315078-A1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR Corporation (JP) | 2011-04-27 | — | — | EP | claimed |
| US-20110065889-A1 | POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | claimed |
| EP-2203519-A1 | SULFONATE ESTERS AS LATENT ACID CATALYSTS | King Industries (US) | 2010-07-07 | — | — | EP | claimed |
| US-20090104363-A1 | Sulfonate esters as latent acid catalysts | KING INDUSTRIES | 2009-04-23 | — | — | US | claimed |
| WO-2009045466-A1 | SULFONATE ESTERS AS LATENT ACID CATALYSTS | KING INDUSTRIES (US) | 2009-04-09 | — | — | WO | claimed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | claimed |
| US-6107451-A | CURABLE COMPOSITION OF AN ANHYDRIDE GROUP-CONTAINING POLYMER AND ENAMINO ESTERS OF GIVEN FORMULA SUCH AS N,N'-4-METHYL-1,3-CYCLOHEXYLENEBIS(3-AMINOCROTONIC ACID ETHYL ESTER); LONG POT LIFE AT ROOM TEMPERATURE; CURED PRODUCTS | CIBA SPECIALTY CHEMICALS CORP. (US) | 2000-08-22 | — | — | US | claimed |
| US-12043702-B2 | Polymer, composition, molded article, cured product and laminate | JSR CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| CN-111381439-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2024-07-19 | — | — | CN | disclosed |
| US-RE32618-E | ANTIOXIDANTS | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1988-03-01 | — | — | US | disclosed |
| US-4308199-A | ANTIOXIDANTS | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1981-12-29 | — | — | US | disclosed |