SCHEMBL1920971

SCHEMBL1920971

COC(OC)[SiH2]CCCCCC[SiH2]C(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL558284 1.00
SCHEMBL17373020 1.00
SCHEMBL704741 0.97
SCHEMBL646422 0.91
SCHEMBL17750065 0.90 TSHR (0.38)
SCHEMBL12805406 0.90 TSHR (0.38)
SCHEMBL114513 0.90 TSHR (0.38)
SCHEMBL114101 0.90 TSHR (0.38)
SCHEMBL17750050 0.90 TSHR (0.38)
SCHEMBL114287 0.90 TSHR (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3187558-B1 MOISTURE CURABLE SILYLATED POLYMER COMPOSITIONS CONTAINING REACTIVE MODIFIERS MOMENTIVE PERFORMANCE MAT INC (US) 2021-03-24 EP claimed
CN-114846374-B Optical laminate and image display device 住友化学株式会社 2024-11-01 CN disclosed
CN-114450375-B Adhesive composition 住友化学株式会社 2024-10-25 CN disclosed
WO-2024150783-A1 ADHESIVE COMPOSITION, ADHESIVE LAYER, OPTICAL FILM WITH ADHESIVE LAYER, AND DISPLAY DEVICE 住友化学株式会社 2024-07-18 WO disclosed
CN-113825811-B Adhesive composition 住友化学株式会社 2024-01-05 CN disclosed
CN-117310849-A Optical laminate 住友化学株式会社 2023-12-29 CN disclosed
CN-114502680-B Adhesive composition 住友化学株式会社 2023-12-01 CN disclosed
CN-112566949-B Resin and adhesive composition 住友化学株式会社 2023-06-23 CN disclosed
CN-110249019-B Adhesive composition 住友化学株式会社 2023-05-26 CN disclosed
CN-113474688-B Optical layer and laminate comprising same 住友化学株式会社 2023-05-12 CN disclosed
EP-1978382-A1 PHOTOCHROMIC OPTICAL ELEMENT Tokuyama Corporation (JP) 2008-10-08 EP disclosed
US-20070238039-A1 SYNTHESIS OF AROMATIC SILICON-CONTAINING COMPOUNDS XEROX CORPORATION (US) 2007-10-11 US disclosed
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-20070020540-A1 Silane-phenol compound, overcoat formulation, and electrophotographic imaging member XEROX CORPORATION 2007-01-25 US disclosed
US-20070020539-A1 Imaging member XEROX CORPORATION 2007-01-25 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1684121-A1 Outmost layer for photoreceptors Xerox Corporation (US) 2006-07-26 EP disclosed
US-20060154161-A1 Crosslinked siloxane outmost layer having aromatic siliconcontaining compounds for photoreceptors XEROX CORPORATION (US) 2006-07-13 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed