SCHEMBL1921952

SCHEMBL1921952

Cc1ccc(Nc2ccc(-c3ccc(Nc4ccc(C)c(C)c4)cc3)cc2)cc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
MAPT P10636 4/20 0.47
ALOX15 P16050 2/20 0.47
HPGD P15428 1/20 0.47
HSD17B10 Q99714 1/20 0.47
CYP3A4 P08684 1/20 0.47
THRB P10828 1/20 0.47
RECQL P46063 1/20 0.47
HIF1A Q16665 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
GAA P10253 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
MEN1 O00255 1/20 0.47
G6PD P11413 1/20 0.47
KMT2A Q03164 1/20 0.47
TP53 P04637 2/20 0.46
POLB P06746 1/20 0.45
JAK2 O60674 1/20 0.44
KDM4E B2RXH2 1/20 0.44
XDH P47989 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25994059 1.00 ALDH1A1 (0.47) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL1921405 0.93 GAA (0.52) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL20208781 0.92 NPSR1 (0.48) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL30659222 0.92 NPSR1 (0.48) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL5419302 0.92 NPSR1 (0.48) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL1155655 0.90 ALDH1A1 (0.53) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL30508518 0.90 ALDH1A1 (0.53) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL31549984 0.90 ALDH1A1 (0.53) ALDH1A1MAPTALOX15HPGDHSD17B10
SCHEMBL11962243 0.87 ALDH1A1 (0.42) ALDH1A1MAPTALOX15HPGDHSD17B10
Biphenyl SCHEMBL5422713 0.86 MAPT (0.49) ALDH1A1MAPTALOX15HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021020463-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE 旭化成株式会社 2021-02-04 WO disclosed
EP-1528074-B1 NOVEL TRIARYLAMINE POLYMER, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF TOSOH CORP (JP) 2014-03-26 EP disclosed
EP-2327739-A1 Novel triarylamine polymer, process for its production and its use TOSOH CORPORATION (JP) 2011-06-01 EP disclosed
US-7608680-B2 Triarylamine polymer, process for producing the same, and use thereof TOSOH CORPORATION (JP) 2009-10-27 US disclosed
US-20060241278-A1 Novel triarylamine polymer, process for producing the same, and use thereof TOSOH CORPORATION (JP) 2006-10-26 US disclosed
US-20060017040-A9 Novel triarylamine polymer, process for producing the same, and use thereof SUZUKI TAKAO 2006-01-26 US disclosed
EP-1528074-A1 NOVEL TRIARYLAMINE POLYMER, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF Tosoh Corporation (JP) 2005-05-04 EP disclosed
US-20040262574-A1 Novel triarylamine polymer, process for producing the same, and use thereof TOSOH CORPORATION (JP) 2004-12-30 US disclosed