⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12157326 | 0.85 | CYP4F2 (0.32) | — | |
| SCHEMBL12039729 | 0.83 | POLB (0.34) | — | |
| SCHEMBL4277430 | 0.81 | POLB (0.33) | — | |
| SCHEMBL19954358 | 0.80 | — | — | |
| SCHEMBL20820968 | 0.78 | — | — | |
| SCHEMBL9963801 | 0.77 | CYP4F2 (0.33) | — | |
| SCHEMBL15115537 | 0.77 | GAA (0.33) | — | |
| SCHEMBL12039734 | 0.76 | ALDH1A1 (0.36) | — | |
| SCHEMBL18850242 | 0.75 | — | — | |
| SCHEMBL18898224 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10023674-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20170226252-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |