SCHEMBL18898224

SCHEMBL18898224

CCC(C)(I)C(=O)OCCC(C)(O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20820968 0.87 — —
SCHEMBL1627910 0.83 CYP4F2 (0.35) —
SCHEMBL18845146 0.81 POLB (0.31) —
SCHEMBL18898222 0.81 — —
SCHEMBL5613479 0.76 HCAR2 (0.36) —
SCHEMBL18473417 0.76 — —
SCHEMBL19480413 0.76 — —
SCHEMBL19220940 0.75 — —
SCHEMBL12108448 0.73 CYP4F2 (0.37) —
SCHEMBL5613175 0.73 ALDH1A1 (0.48) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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