Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 3/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CNR1 | P21554 | 2/20 | 0.37 |
| ▸ | CNR2 | P34972 | 2/20 | 0.37 |
| ▸ | THRA | P10827 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.34 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.34 |
| ▸ | SOAT1 | P35610 | 5/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18872214 | 0.99 | SLC2A1 (0.43) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL19043707 | 0.87 | PTGS2 (0.42) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL25738336 | 0.85 | PTGS2 (0.48) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL14839250 | 0.85 | MEN1 (0.52) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL10192728 | 0.84 | MEN1 (0.47) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL25738337 | 0.84 | PTGS2 (0.47) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL19245686 | 0.84 | SLC2A1 (0.39) | SLC2A1PTGS2MEN1HTTKMT2A | |
| SCHEMBL17285492 | 0.83 | PTGS2 (0.44) | PTGS2MEN1HTTKMT2ACYSLTR2 | |
| SCHEMBL25738341 | 0.82 | PTGS2 (0.45) | PTGS2MEN1HTTKMT2ACNR1 | |
| SCHEMBL25738335 | 0.81 | PTGS2 (0.49) | SLC2A1PTGS2MEN1HTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| EP-3205640-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-08-16 | — | — | EP | disclosed |